Sangick Lee
Inventor
Stats
- 0 US patents issued
- 5 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 5 US Applications Filed
- 7 Total Citation Count
- Aug 6, 2024 Most Recent Filing
- Mar 24, 2006 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
SAMSUNG CORNING PRECISION GLASS CO., LTD. | 1
| 2006
|
SAMSUNG CORNING PRECISION MATERIALS CO., LTD. | 1
| 2009
|
Inventor Addresses
Address | Duration |
---|---|
Daejeon, KR | Jul 06, 23 - Jan 30, 25 |
Suwon-si, KR | Sep 28, 06 - Sep 17, 09 |
Technology Profile
Technology | Matters | |
---|---|---|
C07F: | ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM | 1 |
C08J: | WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER- TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C C08F, C08G or C08H | 2 |
C09K: | MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR | 2 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
2025/0034,349 | 2025 | Method for Removing Chlorine From Pyrolysis Process of Waste Plastic | 0 |
2024/0294,725 | 2024 | Method for Removing Chlorine From Pyrolysis Process of Waste Plastic | 0 |
2023/0212,196 | 2023 | INDIUM COMPOUND, METHOD OF PRODUCING THE SAME, COMPOSITION FOR DEPOSITING INDIUM-CONTAINING THIN FILM, AND INDIUM-CONTAINING THIN FILM | 0 |
2009/0229,189 | 2009 | METHOD FOR PREPARING A POLISHING SLURRY HAVING HIGH DISPERSION STABILITY | 0 |
2006/0213,126 | 2006 | Method for preparing a polishing slurry having high dispersion stability | 3 |
We are sorry but your current selection exceeds the maximum number of portfolios (0) for this membership level.
>
Upgrade to our Level for up to -1 portfolios!.