Hyung-Rae Lee

Inventor

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Work History

Patent OwnerApplications FiledYear
INFINEON TECHNOLOGIES AG
2
2
2009
2010
GLOBALFOUNDRIES SINGAPORE PTE. LTD.
2
2009
INTERNATIONAL BUSINESS MACHINES CORPORATION
4
2
2009
2010
NXP USA, INC.
2
2009
SNU R&DB FOUNDATION
1
2015
CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
2
2
2009
2010
SAMSUNG ELECTRONICS CO., LTD.
2
1
4
2
2
1
2
2
5
2005
2006
2009
2010
2011
2012
2013
2014
2015
SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
1
2015
FUJIFILM CORPORATION
2
2013

Inventor Addresses

AddressDuration
Hwaseong-si, KRFeb 02, 12 - Apr 04, 17
Kyunggi-do, KRJan 27, 11 - Jan 08, 13
Seoul, KRJun 01, 06 - Jun 12, 12
Whasung, KRJul 10, 12 - Jul 10, 12
Whasung-city, KRApr 21, 11 - Apr 21, 11

Technology Profile

Technology Matters
G03C: PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 1
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 6
G06F: ELECTRIC DIGITAL DATA PROCESSING 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
96138212017Method of forming patterns and method of manufacturing integrated circuit device0
94126042016Methods of manufacturing semiconductor device0
93370322016Method of forming pattern of semiconductor device0
2016/0049,3062016Methods of Manufacturing Semiconductor Device2
2015/0364,3342015METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE7

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