Hyo-Young KWON
Inventor
Stats
- 11 US patents issued
- 15 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 11 US Patents Issued
- 15 US Applications Filed
- 44 Total Citation Count
- Aug 3, 2017 Most Recent Filing
- Nov 21, 2012 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
CHEIL INDUSTRIES INC. | 4
8 3 | 2012
2013 2014 |
SAMSUNG SDI CO., LTD. | 8
1 | 2015
2016 |
Inventor Addresses
Address | Duration |
---|---|
Suwon-si, Gyeonggi-do, KR | Feb 11, 16 - Feb 11, 16 |
Suwon-si, KR | Oct 01, 15 - Jun 18, 19 |
Uiwang-si, KR | Jun 26, 14 - Aug 08, 17 |
Technology Profile
Technology | Matters | |
---|---|---|
B05D: | PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL | 1 |
C07C: | ACYCLIC OR CARBOCYCLIC COMPOUNDS | 4 |
C08G: | MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS | 8 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
10323124 | 2019 | Polymer, organic layer composition, organic layer, and method of forming patterns | 0 |
10066057 | 2018 | Organic layer composition, organic layer, and method of forming patterns | 2 |
9971243 | 2018 | Polymer, organic layer composition, organic layer, and method of forming patterns | 2 |
9862668 | 2018 | Monomer, polymer, organic layer composition, organic layer, and method of forming patterns | 0 |
2017/0327,640 | 2017 | MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION | 1 |
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