BYUNG-IN KWON
Inventor
Stats
- 0 US patents issued
- 9 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 9 US Applications Filed
- 1 Total Citation Count
- Mar 4, 2020 Most Recent Filing
- Oct 23, 2019 Earliest Filing
Work History
No Work History Available.Inventor Addresses
| Address | Duration |
|---|---|
| Singapore, SG | Jun 18, 20 - Oct 10, 23 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B01D: | SEPARATION | 1 |
| F24F: | AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING | 1 |
| G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 6 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 11779871 | 2023 | Exhaust module for wafer baking apparatus and wafer processing system having the same | 0 |
| 11693307 | 2023 | Reticle pod for preventing haze contamination and reticle stocker having the same | 0 |
| 11342184 | 2022 | Method of forming multiple patterned layers on wafer and exposure apparatus thereof | 0 |
| 11340523 | 2022 | Correction method of photomask pattern | 0 |
| 2021/0208,516 | 2021 | RETICLE STAGE FOR PREVENTING HAZE CONTAMINATION AND EXPOSURE APPARATUS HAVING THE SAME | 0 |
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