Michiel Kupers
Inventor
Stats
- 2 US patents issued
- 13 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 2 US Patents Issued
- 13 US Applications Filed
- 70 Total Citation Count
- Jan 24, 2023 Most Recent Filing
- Mar 26, 2008 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| POLARIS INNOVATIONS LIMITED | 4
| 2008
|
Inventor Addresses
| Address | Duration |
|---|---|
| Dresden, DE | Oct 01, 09 - May 14, 13 |
| Roermond, NL | Dec 27, 18 - Oct 10, 23 |
| Veldhoven, NL | Jul 23, 24 - Jul 23, 24 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| G01C: | MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY | 1 |
| G01N: | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES | 3 |
| G01R: | MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 12044981 | 2024 | Method and apparatus for optimization of lithographic process | 0 |
| 11782349 | 2023 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | 0 |
| 11774862 | 2023 | Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus | 0 |
| 2023/0168,591 | 2023 | METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD, CONTROL SYSTEM FOR A LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS | 0 |
| 11592753 | 2023 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | 0 |
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