Hiroshi Komiya

Inventor

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Work History

Patent OwnerApplications FiledYear
ADVANTEST CORPORATION
1
1
1998
1999
KOYO SEIKO CO., LTD.
1
1
1
2
4
1985
1996
1997
2000
2002
KURASHIKI BOSEKI KABUSHIKI KAISHA
1
2012
JTEKT CORPORATION
2
2004
NHK SPRING CO., LTD.
2
2010
NIPPON GREASE CO., LTD.
1
1
2
1985
1997
2004
TOKYO ELECTRON LIMITED
1
2
1
2
1
1
2009
2010
2012
2013
2014
2017

Inventor Addresses

AddressDuration
Gyoda, JPAug 08, 00 - Jul 23, 13
Gyoda-shi, JPJan 27, 11 - Jan 27, 11
Kashihara, JPDec 31, 96 - Mar 07, 06
Kashihara-shi, JPDec 05, 02 - Dec 19, 02
Koshi City, JPAug 29, 13 - Mar 05, 20
Koshi, JPOct 29, 13 - Jan 02, 24
Koshi-Shi, JPApr 07, 11 - Apr 07, 11
Koshi-shi, JPFeb 28, 13 - Nov 19, 20
Koshi-shi, Kumamoto, JPNov 22, 18 - Dec 13, 18
Kumamoto, JPMay 14, 15 - Mar 23, 23
Nara, JPMay 26, 87 - Feb 17, 09
Nara-ken, JPJan 01, 02 - Jan 01, 02
Osaka, JPAug 13, 02 - Aug 13, 02
Tosu-Shi, JPFeb 25, 10 - Feb 25, 10

Technology Profile

Technology Matters
B01D: SEPARATION 1
B01F: MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING 2
B05B: SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 2

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
118624862024Substrate liquid processing apparatus, substrate liquid processing method and recording medium0
117127102023Substrate processing apparatus and substrate processing method1
2023/0091,8752023FILTER CLEANING SYSTEM AND FILTER CLEANING METHOD0
113538942022Liquid processing apparatus and liquid processing method0
110945682021Processing apparatus, abnormality detection method, and storage medium0

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