Kenji Kanbara

Inventor

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Work History

Patent OwnerApplications FiledYear
SUMITOMO ELECTRIC INDUSTRIES, LTD.
2
3
1
2013
2014
2015
TORAY ENGINEERING CO., LTD.
2
2002

Inventor Addresses

AddressDuration
Itami, JPAug 27, 19 - Aug 27, 19
Itami-shi, JPJan 04, 18 - Jan 17, 19
Osaka, JPJan 31, 17 - Jun 18, 24
Osaka-shi, JPDec 26, 13 - Aug 08, 19
Otsu, JPNov 02, 04 - Nov 02, 04
Shiga, JPJun 12, 03 - Jun 12, 03

Technology Profile

Technology Matters
B41M: PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING 1
C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 2
C30B: SINGLE-CRYSTAL GROWTH 5

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
120149242024Silicon carbide epitaxial substrate and method for manufacturing silicon carbide semiconductor device0
2021/0320,0052021SILICON CARBIDE EPITAXIAL SUBSTRATE AND METHOD FOR MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE0
105266992020Silicon carbide epitaxial substrate and method for manufacturing silicon carbide semiconductor device0
103961632019Silicon carbide epitaxial substrate and method for manufacturing silicon carbide semiconductor device1
2019/0242,0142019Silicon Carbide Epitaxial Substrate and Method for Manufacturing Silicon Carbide Semiconductor Device0

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