Sivananda Krishnan Kanakasabapathy
Inventor
Stats
- 0 US patents issued
- 16 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 16 US Applications Filed
- 42 Total Citation Count
- Nov 22, 2024 Most Recent Filing
- Jan 29, 2019 Earliest Filing
Work History
No Work History Available.Inventor Addresses
Address | Duration |
---|---|
Pleasanton, CA, US | Aug 01, 19 - Mar 13, 25 |
Technology Profile
Technology | Matters | |
---|---|---|
C04B: | LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS | 3 |
C23C: | COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL | 6 |
G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 8 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
2025/0087,498 | 2025 | TIN OXIDE MANDRELS IN PATTERNING | 0 |
2025/0068,065 | 2025 | ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER | 0 |
12183589 | 2024 | Tin oxide mandrels in patterning | 0 |
12183604 | 2024 | Integrated dry processes for patterning radiation photoresist patterning | 0 |
2024/0355,650 | 2024 | DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEVELOPMENT BYPRODUCTS IN WAFERS | 2 |
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