Sivananda K Kanakasabapathy

Inventor

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Work History

Patent OwnerApplications FiledYear
INFINEON TECHNOLOGIES AG
3
2004
AURIGA INNOVATIONS, INC.
2
2
2011
2012
INTERNATIONAL BUSINESS MACHINES CORPORATION
2
5
4
2
2
7
2
4
3
18
4
12
40
36
17
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013
2014
2015
2016
2017
RENESAS ELECTRONICS CORPORATION
1
2012
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
2
2001
SAMSUNG ELECTRONICS CO., LTD.
2
2003
GLOBALFOUNDRIES INC.
4
4
2
6
9
7
8
3
2
1
2007
2008
2009
2010
2011
2012
2013
2014
2015
2016

Inventor Addresses

AddressDuration
Albany, NY, USAug 12, 10 - Jun 05, 18
Hopewell Junction, NYAug 23, 05 - Sep 11, 08
Hopewell Junction, NY, USApr 14, 05 - Apr 24, 12
NISKAYUNA, NY, USJul 27, 17 - Jul 27, 17
Niskayuna, NY, USMar 05, 09 - Feb 20, 25
Pleasanton, CA, USMay 31, 18 - Oct 31, 24
Richardson, TXApr 05, 05 - Apr 05, 05
Richardson, TX, USOct 03, 02 - Oct 03, 02

Technology Profile

Technology Matters
B05C: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1
B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM 1
B44C: PRODUCING DECORATIVE EFFECTS 3

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2025/0062,1262025SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH CONFIGURATIONS0
2024/0363,7552024FORMING A SACRIFICIAL LINER FOR DUAL CHANNEL DEVICES0
RE501742024Structure and process to tuck fin tips self-aligned to gates0
121069632024Self aligned pattern formation post spacer etchback in tight pitch configurations0
2024/0096,6272024SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH CONFIGURATIONS0

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