Hiroto KUDO

Inventor

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Work History

Patent OwnerApplications FiledYear
A SCHOOL CORPORATION KANSAI UNIVERSITY
2
2016
DAICEL CORPORATION
1
2015
MITSUBISHI GAS CHEMICAL COMPANY, INC.
2
2016
THE SCHOOL CORPORATION KANSAI UNIVERSITY
1
2015

Inventor Addresses

AddressDuration
Osaka, JPMar 02, 17 - Jun 15, 23
Suita, JPMay 28, 19 - Dec 26, 23
Suita-shi, JPOct 05, 17 - Oct 05, 17
Suita-shi, Osaka, JPAug 30, 18 - Mar 04, 21

Technology Profile

Technology Matters
C07C: ACYCLIC OR CARBOCYCLIC COMPOUNDS 2
C07D: HETEROCYCLIC COMPOUNDS 2
C07F: ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
118529702023Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin0
2023/0185,1912023COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT0
2021/0063,8802021RESIST COMPOSITION AND PATTERN FORMATION METHOD USING SAME, COMPOUND AND RESIN0
2020/0257,1952020COMPOSITION FOR LITHOGRAPHY, PATTERN FORMATION METHOD, AND COMPOUND0
2020/0057,3702020COMPOUND, RESIST COMPOSITION CONTAINING COMPOUND AND PATTERN FORMATION METHOD USING SAME1

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