Hirotomo Kawahara
Inventor
Stats
- 2 US patents issued
- 23 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 2 US Patents Issued
- 23 US Applications Filed
- 81 Total Citation Count
- Mar 6, 2024 Most Recent Filing
- Nov 24, 2014 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| ASAHI GLASS COMPANY, LIMITED | 1
3 1 4 | 2014
2015 2016 2017 |
Inventor Addresses
| Address | Duration |
|---|---|
| Chiyoda-ku, JP | Feb 09, 17 - Apr 14, 20 |
| Cupertino, CA, US | Mar 10, 22 - May 14, 24 |
| Cuptertino, CA, US | Jun 20, 24 - Jun 20, 24 |
| Tokyo, JP | Apr 16, 15 - Feb 25, 25 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B32B: | LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM | 4 |
| B60J: | WINDOWS, WINDSCREENS, NON-FIXED ROOFS, DOORS, OR SIMILAR DEVICES FOR VEHICLES; REMOVABLE EXTERNAL PROTECTIVE COVERINGS SPECIALLY ADAPTED FOR VEHICLES | 2 |
| C03C: | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS | 7 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 12235575 | 2025 | Reflective mask blank for EUV lithography and substrate with conductive film | 0 |
| 12216397 | 2025 | Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof | 0 |
| 12038685 | 2024 | Reflective mask blank for EUV lithography | 0 |
| 2024/0210,814 | 2024 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAME | 0 |
| 2024/0201,576 | 2024 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY | 0 |
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