Masayuki Jyumonji

Inventor

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Work History

Patent OwnerApplications FiledYear
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO., LTD.
2
9
5
13
7
3
1
1
2002
2003
2004
2005
2006
2007
2008
2009
ADVANCED LCD TECHNOLOGIES DEVELOPMENT
2
2004
PANASONIC LIQUID CRYSTAL DISPLAY CO., LTD.
2
2
2004
2006
KABUSHIKI KAISHA EKISHO SENTAN GIJUTSU KAIHATSU CENTER
2
1
2003
2005
SHARP KABUSHIKI KAISHA
2
2
2
3
2
2
2003
2004
2005
2006
2008
2009
JAPAN DISPLAY CENTRAL INC.
2
2
2003
2005
LG ELECTRONICS INC.
2
2010

Inventor Addresses

AddressDuration
Kawasaki, JPAug 18, 09 - Nov 16, 10
Kawasaki-shi, JPDec 07, 06 - Sep 10, 09
Yokohama, JPMar 22, 05 - May 22, 12
Yokohama-Shi, JPJul 22, 04 - Jul 22, 04
Yokohama-shi, JPJul 17, 03 - Dec 02, 10

Technology Profile

Technology Matters
A61N: ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 1
B05B: SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 1
B23K: SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 5

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
81831222012Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus for the semiconductor thin film0
81142172012Crystallization method, crystallization apparatus, processed substrate, thin film transistor and display apparatus1
2010/0304,5462010SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR THIN FILM, WHICH IS SUBJECTED TO HEAT TREATMENT TO HAVE ALIGNMENT MARK, CRYSTALLIZING METHOD FOR THE SEMICONDUCTOR THIN FILM, AND CRYSTALLIZING APPARATUS FOR THE SEMICONDUCTOR THIN FILM3
78333492010Phase shifter for laser annealing0
76928642010Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, manufacturing method of thin film transistor, and manufacturing method of matrix circuit substrate of display1

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