Yasuto ISHIDA

Inventor

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Work History

Patent OwnerApplications FiledYear
FUJIMI INCORPORATED
2
2
1
2011
2013
2015

Inventor Addresses

AddressDuration
Aichi, JPMar 21, 19 - Oct 11, 22
Kakamigahara, JPApr 22, 14 - Apr 22, 14
Kakamigahara-shi, JPJul 28, 11 - Jul 28, 11
Kiyosu, JPNov 08, 16 - Mar 11, 25
Kiyosu-shi, Aichi, JPDec 03, 15 - May 06, 21
Kiyosu-shi, JPMar 26, 20 - Feb 16, 23
Miaoli County, CNOct 09, 18 - Oct 09, 18
Miaoli County, Taiwan Provience, CNOct 19, 17 - Oct 19, 17

Technology Profile

Technology Matters
B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 2
B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 4
B44C: PRODUCING DECORATIVE EFFECTS 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
122495132025Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment0
117025702023Polishing composition0
116921372023Intermediate raw material, and polishing composition and composition for surface treatment using the same0
2023/0048,7222023SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT1
2023/0053,2102023SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT0

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