Yoshiaki Ikuta

Inventor

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Work History

Patent OwnerApplications FiledYear
JAPAN SCIENCE AND TECHNOLOGY AGENCY
1
2005
Mitsubishi Jukogyo Kabushiki Kaisha
1
1
1987
1989
Onco Therapy Science, Inc.
2
2
1
2007
2011
2013
OSAKA GAS CO., LTD.
1
1987
Glory Kogyo Kabushiki Kaisha
1
2
2
2
1984
2001
2004
2010
LSIP, LLC
2
2005
ASAHI GLASS COMPANY, LIMITED
2
4
4
4
5
15
2
4
2
6
2
2
6
2
2000
2001
2002
2004
2005
2006
2008
2010
2011
2012
2013
2014
2015
2016
SEMATECH, INC.
2
1
2005
2011

Inventor Addresses

AddressDuration
Chiyoda-ku, JPNov 19, 09 - Feb 23, 21
Fukushima, JPAug 11, 05 - Aug 11, 05
Guilderland, NYMar 15, 07 - Jul 12, 07
Guilderland, NY, USJan 12, 06 - Jun 14, 11
Himeji, JPDec 17, 85 - Apr 13, 10
Himeji-Shi, JPAug 23, 01 - Oct 14, 04
Hyogo-Ken, JPJul 08, 10 - Aug 28, 12
Kanagawa, JPNov 01, 01 - May 06, 08
Kumamoto, JPApr 30, 09 - Sep 01, 15
Schenectady, NYSep 21, 06 - Apr 24, 08
Schenectady, NY, USMar 17, 09 - Jun 26, 12
Tokyo, JPJul 12, 88 - Sep 15, 16
Yokohama, JPDec 31, 02 - Mar 26, 13
Yokohama-shi, JPMar 20, 03 - Feb 01, 07

Technology Profile

Technology Matters
A47G: HOUSEHOLD OR TABLE EQUIPMENT 1
A61K: PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES 3
B05D: PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 2

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
109287212021Reflective mask blank for EUV lithography2
97397222017Reflective mask blank for EUV lithography, and process for its inspection and process for its production0
2016/0357,1002016REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY31
2016/0266,4822016GLASS SUBSTRATE FOR MASK BLANK1
2016/0168,0202016METHOD OF FINISHING PRE-POLISHED GLASS SUBSTRATE SURFACE1

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