Tomohiro Iseki

Inventor

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Work History

Patent OwnerApplications FiledYear
TOKYO ELECTRON LIMITED
2
4
5
2
4
4
8
4
2
4
7
1
2004
2005
2006
2007
2008
2009
2010
2011
2013
2014
2015
2016

Inventor Addresses

AddressDuration
Hsin-Chu, TWAug 19, 10 - Feb 17, 15
Kikuchi-gun, JPMar 30, 06 - Mar 30, 06
Koshi City, JPJun 17, 10 - Feb 21, 19
Koshi, JPOct 26, 10 - Jan 26, 21
Koshi-Shi, JPDec 17, 15 - Mar 10, 16
Koshi-machi, JPJan 20, 09 - Jan 20, 09
Koshi-shi, JPApr 26, 07 - Sep 19, 13
Kumamoto, JPAug 19, 04 - Mar 31, 20
Yokohama-shi, JPJun 09, 22 - Jun 09, 22

Technology Profile

Technology Matters
B01D: SEPARATION 2
B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 1
B05B: SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES 4

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2022/0176,3412022METAL OXIDE, OXYGEN ADSORPTION AND DESORPTION DEVICE, OXYGEN CONCENTRATING DEVICE, AND METHOD FOR PRODUCING METAL OXIDE0
109013202021Developing method, developing apparatus, and computer-readable recording medium0
106061772020Substrate processing apparatus, substrate processing method, and storage medium0
2019/0056,6662019Developing Method, Developing Apparatus, and Computer-Readable Recording Medium0
102110502019Method for photo-lithographic processing in semiconductor device manufacturing1

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