Chunsheng Huang
Inventor
Stats
- 6 US patents issued
- 12 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 6 US Patents Issued
- 12 US Applications Filed
- 193 Total Citation Count
- Sep 26, 2019 Most Recent Filing
- Oct 15, 1993 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
NANOMETRICS INCORPORATED | 1
1 1 | 2003
2004 2005 |
KLA-TENCOR CORPORATION | 1
2 3 | 2011
2012 2016 |
Tropel Corporation | 1
| 1993
|
ESGW Holdings Limited | 1
| 2007
|
Inventor Addresses
Address | Duration |
---|---|
Milpitas, CA, US | Feb 08, 18 - Jun 18, 19 |
San Jose, CA | May 16, 95 - Oct 07, 08 |
San Jose, CA, US | Jan 30, 14 - Oct 20, 20 |
Shenzhen, CN | Nov 11, 08 - Nov 11, 08 |
Technology Profile
Technology | Matters | |
---|---|---|
G01B: | MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS | 5 |
G01J: | MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY | 2 |
G01N: | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES | 4 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
10809055 | 2020 | Apparatus and method for measuring topography and gradient of the surfaces, shape, and thickness of patterned and unpatterned wafers | 2 |
10732424 | 2020 | Inspection-beam shaping on a sample surface at an oblique angle of incidence | 0 |
2020/0132,608 | 2020 | SCANNING DIFFERENTIAL INTERFERENCE CONTRAST IN AN IMAGING SYSTEM DESIGN | 1 |
2020/0033,117 | 2020 | Apparatus and Method for Measuring Topography and Gradient of the Surfaces, Shape, and Thickness of Patterned and Unpatterned Wafers | 2 |
2019/0250,414 | 2019 | Inspection-Beam Shaping on a Sample Surface at an Oblique Angle of Incidence | 0 |
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