Stefan Hunsche
Inventor
Stats
- 18 US patents issued
- 53 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 18 US Patents Issued
- 53 US Applications Filed
- 932 Total Citation Count
- Oct 28, 2024 Most Recent Filing
- Feb 14, 2002 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| CIENA CORPORATION | 2
| 2003
|
| ASML NETHERLANDS B.V. | 10
1 1 2 2 1 3 1 | 2006
2007 2009 2010 2013 2014 2015 2016 |
| FURUKAWA ELECTRIC NORTH AMERICA, INC. | 2
| 2002
|
| ALCATEL-LUCENT USA INC. | 2
| 2002
|
| WSOU INVESTMENTS, LLC | 2
2 | 2002
2003 |
| PROVENANCE ASSET GROUP LLC | 2
| 2002
|
| LUCENT TECHNOLOGIES INC. | 5
5 | 2002
2003 |
Inventor Addresses
| Address | Duration |
|---|---|
| Jersey City, NJ | Sep 19, 02 - Nov 21, 06 |
| Jersey City, NJ, US | Nov 06, 03 - Dec 09, 14 |
| Santa Clara, CA, US | Aug 13, 15 - Feb 18, 25 |
| Sunnyvale, CA | Nov 04, 04 - Mar 15, 07 |
| Sunnyvale, CA, US | Aug 05, 04 - Sep 09, 14 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| G01B: | MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS | 1 |
| G01N: | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES | 2 |
| G02B: | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS | 2 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 12228862 | 2025 | Selection of measurement locations for patterning processes | 0 |
| 2025/0053,702 | 2025 | PROCESS WINDOW OPTIMIZER | 0 |
| 12189307 | 2025 | Metrology data correction using image quality metric | 0 |
| 12141507 | 2024 | Process window optimizer | 0 |
| 12092965 | 2024 | Process variability aware adaptive inspection and metrology | 0 |
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