Yusuke HAMA
Inventor
Stats
- 2 US patents issued
- 10 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 2 US Patents Issued
- 10 US Applications Filed
- 12 Total Citation Count
- Feb 23, 2023 Most Recent Filing
- Nov 21, 2014 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. | 3
2 1 | 2014
2015 2016 |
| SAMSUNG ELECTRONICS CO., LTD. | 3
| 2014
|
| AZ Electronics Materials (Luxembourg) S.A.R.L. | 2
| 2014
|
Inventor Addresses
| Address | Duration |
|---|---|
| Kakegawa, JP | Sep 19, 17 - Feb 27, 24 |
| Kakegawa-shi, JP | May 28, 15 - Jun 22, 23 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| C07C: | ACYCLIC OR CARBOCYCLIC COMPOUNDS | 2 |
| C08G: | MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS | 5 |
| C08K: | USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS | 2 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 11914296 | 2024 | Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating | 0 |
| 2023/0194,989 | 2023 | ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METHOD FOR MANUFACTURING A COATING BY IT, AND A METHOD FOR MANUFACTURING A DEVICE COMPRISING THE COATING | 0 |
| 11450805 | 2022 | Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same | 0 |
| 11366389 | 2022 | Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same | 0 |
| 2021/0263,414 | 2021 | A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST COATING, ETCHED PHOTORESIST COATING, AND ETCHED SI CONTAINING LAYER(S), AND MANUFACTURING A DEVICE USING THEREOF | 0 |
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