Dingkai Guo
Inventor
Stats
- 0 US patents issued
- 2 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 2 US Applications Filed
- 2 Total Citation Count
- Oct 13, 2016 Most Recent Filing
- Feb 5, 2014 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| ATMI Korea Co., Ltd | 1
| 2014
|
| ENTEGRIS, INC. | 1
1 | 2014
2016 |
Inventor Addresses
| Address | Duration |
|---|---|
| Danbury, CT, US | Dec 17, 15 - Jan 22, 19 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| C01G: | COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F | 1 |
| C23C: | COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL | 2 |
| H01L: | SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | 2 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 10186570 | 2019 | ALD processes for low leakage current and low equivalent oxide thickness BiTaO films | 1 |
| 2017/0103,888 | 2017 | AMINE CATALYSTS FOR LOW TEMPERATURE ALD/CVD SiO2 DEPOSITION USING HEXACHLORODISILANE/H2O | 0 |
| 2015/0364,537 | 2015 | ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THICKNESS BiTaO FILMS | 0 |
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