Toralf Gruner

Inventor

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Work History

Patent OwnerApplications FiledYear
CARL ZEISS SMT AG
2
2008
CARL ZEISS SMT GMBH
2
4
13
21
17
4
14
19
21
11
19
7
16
10
11
6
2001
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013
2014
2015
2016
2017
Carl Zeiss
1
1
2005
2008
CARL ZEISS SMT AG
4
10
6
4
1
1
2002
2004
2005
2006
2007
2009

Inventor Addresses

AddressDuration
Aalen, DEJan 06, 05 - Feb 06, 25
Aalen-Hofen, DEJun 03, 04 - Feb 11, 25
Aalen-Hofen, GBMar 02, 10 - Mar 02, 10
Aalen-hofen, DEMay 07, 09 - Nov 19, 09
Chemnitz, DEDec 19, 02 - Jun 27, 06
Königsbronn, DENov 08, 05 - Apr 11, 06
Koenigsbronn, DEJan 29, 04 - Jan 11, 05
Koenigsbtronn, DEDec 05, 02 - Dec 05, 02
Konigsbronn, DEJan 20, 05 - Jan 20, 05
Oberkochen, DEJun 20, 02 - Dec 19, 24

Technology Profile

Technology Matters
B05D: PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1
B23K: SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 1
B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
122226552025Stop, optical system and lithography apparatus0
2025/0044,7122025OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS0
122102892025Mirror, in particular for a microlithographic projection exposure apparatus0
2024/0416,4612024METHOD FOR PRODUCING A TEMPERATURE-CONTROLLING HOLLOW STRUCTURE IN A SUBSTRATE USING A PROCESSING LIGHT BEAM0
2024/0288,7842024OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD0

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