Marcela Gonzales
Inventor
Stats
- 3 US patents issued
- 4 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 3 US Patents Issued
- 4 US Applications Filed
- 24 Total Citation Count
- Mar 19, 2004 Most Recent Filing
- Feb 12, 2002 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| The United States of America as represented by the United States Department of Energy | 2
| 2002
|
| SANDIA NATIONAL LABORATORIES | 4
1 | 2002
2004 |
| NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA, LLC | 4
1 | 2002
2004 |
Inventor Addresses
| Address | Duration |
|---|---|
| Seattle, WA | Jan 20, 04 - Mar 07, 06 |
| Seattle, WA, US | Aug 14, 03 - Nov 20, 03 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B28B: | SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG OR MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER | 1 |
| B29C: | SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING | 2 |
| B32B: | LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 7008737 | 2006 | Gray scale x-ray mask | 7 |
| 2004/0175,658 | 2004 | Embossing tool having an arbitrary three-dimensional microstructure | 0 |
| 6749997 | 2004 | Method for providing an arbitrary three-dimensional microstructure in silicon using an anisotropic deep etch | 2 |
| 6680263 | 2004 | Method for applying a photoresist layer to a substrate having a preexisting topology | 1 |
| 2003/0215,664 | 2003 | Method for providing an arbitrary three-dimensional microstructure in silicon using an anisotropic deep etch | 1 |
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