AYUMI GODA

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Inventor Addresses

AddressDuration
Tokyo, JPJul 14, 22 - Oct 08, 24

Technology Profile

Technology Matters
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 14

Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
121115652024Reflective photomask blank and reflective photomask0
2024/0288,7632024REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK0
2024/0272,5422024REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK0
2024/0126,1602024REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK0
2024/0118,6042024REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK0

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