David L Grant

Inventor

Add to Portfolio

Stats

Details

Work History

Patent OwnerApplications FiledYear
RUDOLPH TECHNOLOGIES, INC.
1
2
1
1
4
1
2
2003
2005
2007
2009
2011
2013
2016
HEWLETT PACKARD ENTERPRISE DEVELOPMENT LP
1
2
1998
1999
Strasbaugh
2
2013
COMPAQ COMPUTER CORPORATION
1
1999
REVASUM, INC.
2
2013
Sandoz Ltd.
1
1990
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
1
1
2
1
1
1988
1989
1993
1996
2013
Tamar Technology, Inc.
2
1
2005
2007

Inventor Addresses

AddressDuration
1270 Calle El Cameron, Thousand Oaks, CA 91360Mar 23, 04 - Mar 23, 04
Houston, TXJul 10, 90 - Jan 11, 05
Houston, TX, USMay 26, 16 - May 26, 16
Menlo Park, CANov 19, 91 - Nov 19, 91
Newbury Park, CA, USDec 23, 10 - Jul 25, 17
Thousand Oaks, CAMay 25, 06 - Jun 28, 07
Thousand Oaks, CA, USJan 13, 09 - Oct 04, 16

Technology Profile

Technology Matters
A01N: PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF 1
A61L: METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION, OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICAL ARTICLES 1
B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 1

See more…

Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
97148252017Wafer shape thickness and trench measurement2
95879322017System for directly measuring the depth of a high aspect ratio etched feature on a wafer0
94574462016Methods and systems for use in grind shape control adaptation0
2016/0238,3782016SYSTEM FOR DIRECTLY MEASURING THE DEPTH OF A HIGH ASPECT RATIO ETCHED FEATURE ON A WAFER3
2016/0147,2712016POWERING NODES3

See more…


We are sorry but your current selection exceeds the maximum number of portfolios (0) for this membership level.
> Upgrade to our Level for up to -1 portfolios!.