RYOHEI GORAI
Inventor
Stats
- 0 US patents issued
- 2 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 2 US Applications Filed
- 1 Total Citation Count
- Feb 4, 2022 Most Recent Filing
- May 11, 2018 Earliest Filing
Work History
No Work History Available.Inventor Addresses
| Address | Duration |
|---|---|
| Taito-ku, JP | Sep 20, 18 - Apr 20, 21 |
| Tokyo, JP | Apr 11, 24 - Apr 11, 24 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| G02B: | OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS | 1 |
| G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 1 |
| H01L: | SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2024/0118,604 | 2024 | REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK | 0 |
| 10986293 | 2021 | Solid-state imaging device including microlenses on a substrate and method of manufacturing the same | 0 |
| 2018/0269,247 | 2018 | SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME | 1 |
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