Oliver Dier

Inventor

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Work History

Patent OwnerApplications FiledYear
CARL ZEISS SMT GMBH
4
1
2
3
2013
2014
2015
2016

Inventor Addresses

AddressDuration
Lauchheim, DEJul 11, 13 - May 10, 22
Oberkochen, DEDec 19, 24 - Dec 19, 24

Technology Profile

Technology Matters
B82Y: SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES 2
G01B: MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS 1
G01J: MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2024/0419,0662024METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES INTO A SUBSTRATE, IN PARTICULAR INTO A SUBSTRATE FOR AN OPTICAL ELEMENT, METHOD AND SUBSTRATE FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, PROCESSING SYSTEM AND ALSO APPARATUS PERTAINING TO SEMICONDUCTOR TECHNOLOGY AND STRUCTURED ELECTRONIC COMPONENT0
113288312022Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus0
105208272019Optical system, in particular for a microlithographic projection exposure apparatus0
2019/0212,6592019OPTICAL SYSTEM, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS0
103310482019Mirror, in particular for a microlithographic projection exposure apparatus1

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