Jonathan L Cobb
Inventor
Stats
- 3 US patents issued
- 4 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 3 US Patents Issued
- 4 US Applications Filed
- 62 Total Citation Count
- Apr 18, 2006 Most Recent Filing
- Mar 27, 2003 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. | 2
| 2003
|
| NORTH STAR INNOVATIONS INC. | 2
| 2006
|
| FREESCALE SEMICONDUCTOR, INC. | 1
| 2006
|
| NXP USA, INC. | 2
| 2005
|
Inventor Addresses
| Address | Duration |
|---|---|
| Austin, TX | Jan 24, 06 - Oct 18, 07 |
| Austin, TX, US | Sep 30, 04 - Jun 08, 10 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| C03C: | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS | 1 |
| G03C: | PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES | 2 |
| G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 4 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 7732102 | 2010 | Cr-capped chromeless phase lithography | 0 |
| 7670760 | 2010 | Treatment for reduction of line edge roughness | 5 |
| 2007/0243,491 | 2007 | Method of making a semiconductor with a high transmission CVD silicon nitride phase shift mask | 9 |
| 2007/0207,404 | 2007 | Treatment for reduction of line edge roughness | 2 |
| 2007/0015,064 | 2007 | Cr-capped chromeless phase lithography | 0 |
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