Melanie Cloutier

Inventor

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Work History

Patent OwnerApplications FiledYear
SOCPRA SCIENCES ET GENIE S.E.C.
2
2002

Inventor Addresses

AddressDuration
1950 du Montagnais, Apt. #407, Sherbrooke, Quebec, CA J1K 2X9Aug 17, 04 - Aug 17, 04
Sherbrooke, CASep 25, 03 - Sep 25, 03

Technology Profile

Technology Matters
B44C: PRODUCING DECORATIVE EFFECTS 1
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1
G21K: TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 1

Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
67771672004Method of producing an etch-resistant polymer structure using electron beam lithography0
2003/0180,6272003Method of producing an etch-resistant polymer structure using electron beam lithography1

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