Harry Hak-Lay Chuang

Inventor

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Work History

Patent OwnerApplications FiledYear
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., ("TSMC")
4
2010
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
12
23
4
6
12
15
9
2
3
2009
2010
2011
2012
2013
2014
2015
2016
2017
Taiwan Semiconductorr Manufacturing Co., Ltd.
1
2014

Inventor Addresses

AddressDuration
CRESCENT, SGJul 24, 14 - Jul 24, 14
Crescent, SGNov 14, 13 - Dec 20, 16
Hsin-Chu City, TWMar 04, 10 - Sep 13, 12
Hsin-Chu, TWJun 19, 12 - May 24, 16
Hsinchu City, TWMar 10, 11 - Feb 06, 14
Hsinchu, TWMay 22, 12 - Feb 06, 24
Hsinchu-City, TWAug 11, 11 - Aug 11, 11
PAYA LEBAR CRESCENT, SGMar 30, 17 - Mar 30, 17
Paya Lebar Crescent, SGJun 27, 17 - Jun 27, 17
Singapore, SGJan 24, 13 - Aug 09, 22
Singapore, TWOct 13, 15 - Oct 13, 15
Zhubei City, TWFeb 25, 16 - Feb 25, 16
Zhubei, TWAug 15, 17 - Aug 15, 17

Technology Profile

Technology Matters
G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1
G06F: ELECTRIC DIGITAL DATA PROCESSING 1
G11C: STATIC STORES 1

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
118944432024Method of making gate structure of a semiconductor device0
2022/0352,1512022METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE0
2022/0320,3142022METHOD OF MAKING GATE STRUCTURE OF A SEMICONDUCTOR DEVICE0
114109932022Method of manufacturing semiconductor device0
113937262022Metal gate structure of a CMOS semiconductor device and method of forming the same0

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