Jaehyuck CHOI
Inventor
Stats
- 5 US patents issued
- 7 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 5 US Patents Issued
- 7 US Applications Filed
- 29 Total Citation Count
- Mar 13, 2018 Most Recent Filing
- Oct 22, 2013 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| Fine Semitech Corp. | 1
| 2016
|
| SAMSUNG ELECTRONICS CO., LTD. | 2
5 2 | 2013
2015 2016 |
Inventor Addresses
| Address | Duration |
|---|---|
| Seoul, KR | Apr 24, 14 - Apr 30, 19 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B08B: | CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL | 1 |
| C08F: | MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS | 1 |
| C09J: | ADHESIVES; ADHESIVE PROCESSES IN GENERAL | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 10274820 | 2019 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | 1 |
| 10087348 | 2018 | Pellicle including a water-soluble adhesive and photomask assembly including the pellicle | 0 |
| 2018/0203,346 | 2018 | PELLICLE FOR PREVENTING THERMAL ACCUMULATION AND EXTREME ULTRA-VIOLET LITHOGRAPHY APPARATUS HAVING THE SAME | 0 |
| 9952502 | 2018 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | 1 |
| 9766540 | 2017 | Method of forming photomask | 0 |
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