Byoung Ho Choi

Inventor

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Work History

Patent OwnerApplications FiledYear
CHEIL INDUSTRIES INC.
2
2
3
2
2006
2007
2009
2012
BAYER CROPSCIENCE S.A.
1
2006
SAMSUNG ELECTRONICS CO., LTD.
1
11
4
8
3
3
1
2000
2001
2003
2004
2005
2006
2009
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
1
2003
LG ELECTRONICS INC.
5
2007

Inventor Addresses

AddressDuration
Ansan-si, KRJan 01, 09 - Nov 19, 13
Goyang-Si, KRMar 27, 08 - Sep 10, 13
Goyang-si, KROct 25, 07 - Oct 11, 11
Gyeonggi-do, KRMay 23, 02 - Feb 22, 07
Hwaseong-si, KRFeb 10, 05 - Mar 10, 05
Seoul, KRDec 21, 23 - Dec 21, 23
Suwon-Si, KRJul 01, 10 - Jul 01, 10
Suwon-city, KRJul 05, 01 - Feb 15, 07
Suwon-si, KRApr 18, 02 - Apr 18, 02
Taean-eup, KRNov 04, 04 - Nov 04, 04
Uiwang-si, KRJul 01, 10 - Sep 01, 15
Wonju, KRJan 08, 04 - Jan 08, 04

Technology Profile

Technology Matters
A61B: DIAGNOSIS; SURGERY; IDENTIFICATION 1
C09G: POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES 1
C09K: MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR 5

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Patents / Publication

Patents / Publication #Year of Publication / IssuedTitleCitations
2023/0413,6472023STRETCHABLE ENCAPSULANT0
91236602015Chemical mechanical polishing slurry compositions and polishing method using the same0
85864642013Chemical mechanical polishing slurry composition for polishing phase-change memory device and method for polishing phase-change memory device using the same0
85316072013Apparatus for transmitting broadcast signal, method thereof, method of producing broadcast signal and apparatus for receiving broadcast signal0
2012/0282,7752012Chemical Mechanical Polishing Slurry Compositions and Polishing Method Using the Same8

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