Tae Seung Cho
Inventor
Stats
- 5 US patents issued
- 21 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 5 US Patents Issued
- 21 US Applications Filed
- 268 Total Citation Count
- Feb 27, 2023 Most Recent Filing
- Mar 31, 2014 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS | 1
| 2015
|
| APPLIED MATERIALS, INC. | 6
3 2 2 | 2014
2015 2016 2017 |
Inventor Addresses
| Address | Duration |
|---|---|
| San Jose, CA, US | Mar 05, 15 - Jun 11, 24 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| B44C: | PRODUCING DECORATIVE EFFECTS | 1 |
| B81C: | PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICRO-STRUCTURAL DEVICES OR SYSTEMS | 1 |
| C03C: | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 12009228 | 2024 | Low temperature chuck for plasma processing systems | 0 |
| 12002659 | 2024 | Apparatus for generating etchants for remote plasma processes | 0 |
| 11915911 | 2024 | Two piece electrode assembly with gap for plasma control | 0 |
| 11901161 | 2024 | Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes | 0 |
| 2023/0402,262 | 2023 | APPARATUS FOR GENERATING ETCHANTS FOR REMOTE PLASMA PROCESSES | 0 |
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