Rick J Carter
Inventor
Stats
- 1 US patents issued
- 3 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 1 US Patents Issued
- 3 US Applications Filed
- 12 Total Citation Count
- Nov 11, 2019 Most Recent Filing
- May 11, 2016 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
GLOBALFOUNDRIES INC. | 2
1 | 2016
2017 |
Inventor Addresses
Address | Duration |
---|---|
Saratoga Springs, NY, US | Oct 31, 17 - Jan 04, 22 |
Technology Profile
Technology | Matters | |
---|---|---|
H01L: | SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR | 3 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
11217678 | 2022 | Differential SG/EG spacer integration with equivalent NFET/PFET spacer widths and dual raised source drain expitaxial silicon and triple-nitride spacer integration enabling high-voltage EG device on FDSOI | 0 |
2020/0083,346 | 2020 | DIFFERENTIAL SG/EG SPACER INTEGRATION WITH EQUIVALENT NFET/PFET SPACER WIDTHS & DUAL RAISED SOURCE DRAIN EXPITAXIAL SILICON AND TRIPLE-NITRIDE SPACER INTEGRATION ENABLING HIGH-VOLTAGE EG DEVICE ON FDSOI | 0 |
10522655 | 2019 | Differential SG/EG spacer integration with equivalent NFET/PFET spacer widths and dial raised source drain expitaxial silicon and triple-nitride spacer integration enabling high-voltage EG device on FDSOI | 0 |
2018/0012,973 | 2018 | DIFFERENTIAL SG/EG SPACER INTEGRATION WITH EQUIVALENT NFET/PFET SPACER WIDTHS & DUAL RAISED SOURCE DRAIN EXPITAXIAL SILICON AND TRIPLE-NITRIDE SPACER INTEGRATION ENABLING HIGH-VOLTAGE EG DEVICE ON FDSOI | 0 |
2017/0330,953 | 2017 | DIFFERENTIAL SG/EG SPACER INTEGRATION WITH EQUIVALENT NFET/PFET SPACER WIDTHS & DUAL RAISED SOURCE DRAIN EXPITAXIAL SILICON AND TRIPLE-NITRIDE SPACER INTEGRATION ENABLING HIGH-VOLTAGE EG DEVICE ON FDSOI | 2 |
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