Johannes Marcus Maria Beltman
Inventor
Stats
- 0 US patents issued
- 7 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 0 US Patents Issued
- 7 US Applications Filed
- 71 Total Citation Count
- Jul 26, 2022 Most Recent Filing
- Jan 29, 2015 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| ASML NETHERLANDS B.V. | 2
1 | 2015
2016 |
Inventor Addresses
| Address | Duration |
|---|---|
| Knegsel, NL | Mar 03, 16 - Jan 19, 23 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| G01B: | MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS | 5 |
| G01N: | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES | 1 |
| G03F: | PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR | 7 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 2023/0016,664 | 2023 | METROLOGY METHOD, TARGET AND SUBSTRATE | 0 |
| 2022/0057,192 | 2022 | METROLOGY METHOD, TARGET AND SUBSTRATE | 1 |
| 11204239 | 2021 | Metrology method, target and substrate | 2 |
| 2020/0348,125 | 2020 | METROLOGY METHOD, TARGET AND SUBSTRATE | 0 |
| 10725372 | 2020 | Method and apparatus for reticle optimization | 0 |
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