Todd J Bednarek
Inventor
Stats
- 4 US patents issued
- 4 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 4 US Patents Issued
- 4 US Applications Filed
- 24 Total Citation Count
- Oct 15, 2004 Most Recent Filing
- Dec 7, 1994 Earliest Filing
Work History
| Patent Owner | Applications Filed | Year |
|---|---|---|
| EDO CORPORATION, FIBER SCIENCE DIVISION | 1
| 1994
|
| ASML HOLDING N.V. | 2
1 2 | 2002
2003 2004 |
| ASML US, INC. | 2
| 2003
|
| ASML US, LLC | 2
2 | 2002
2004 |
Inventor Addresses
| Address | Duration |
|---|---|
| Southbury, CT | Feb 01, 05 - Mar 21, 06 |
| Southbury, CT, US | Mar 11, 04 - Mar 24, 05 |
| Wolcott, CT | Nov 05, 96 - Nov 05, 96 |
Technology Profile
| Technology | Matters | |
|---|---|---|
| G01B: | MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS | 4 |
| G01C: | MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY | 1 |
| G03C: | PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES | 1 |
Patents / Publication
| Patents / Publication # | Year of Publication / Issued | Title | Citations |
|---|---|---|---|
| 7016051 | 2006 | Reticle focus measurement system using multiple interferometric beams | 0 |
| 6934005 | 2005 | Reticle focus measurement method using multiple interferometric beams | 7 |
| 2005/0062,980 | 2005 | Reticle focus measurement system using multiple interferometric beams | 2 |
| 6850330 | 2005 | Reticle focus measurement system using multiple interferometric beams | 1 |
| 2004/0048,400 | 2004 | Reticle focus measurement method using multiple interferometric beams | 3 |
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