Hiroki Arao
Inventor
Stats
- 3 US patents issued
- 4 US Applications filed
- most recent filing
This is official USPTO record data
Details
- 3 US Patents Issued
- 4 US Applications Filed
- 69 Total Citation Count
- Dec 15, 2006 Most Recent Filing
- Jun 7, 1996 Earliest Filing
Work History
Patent Owner | Applications Filed | Year |
---|---|---|
JGC CATALYSTS AND CHEMICALS LTD. | 3
2 | 2005
2006 |
CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. | 1
| 1996
|
Inventor Addresses
Address | Duration |
---|---|
Fukuoka, JP | Jan 17, 08 - Mar 05, 09 |
Kitakyushu, JP | Sep 01, 98 - Apr 01, 14 |
Technology Profile
Technology | Matters | |
---|---|---|
B01J: | CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS | 1 |
B32B: | LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM | 1 |
C01F: | COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS | 1 |
Patents / Publication
Patents / Publication # | Year of Publication / Issued | Title | Citations |
---|---|---|---|
8686101 | 2014 | Coating liquid for forming low dielectric constant amorphous silica-based coating film and the coating film obtained from the same | 3 |
7998567 | 2011 | Coating liquid for formation of protective film for semiconductor processing and method for preparation of the same | 1 |
2009/0061,199 | 2009 | Coating liquid for formation of protective film for semiconductor processing, method for preparation of the same, and protective film for semiconductor processing made from the coating liquid | 8 |
2009/0025,609 | 2009 | Coating Liquid for Forming Low Dielectric Constant Amorphous Silica-Based Coating Film and the Coating Film Obtained From the Same | 33 |
2008/0011,987 | 2008 | Coating Liquid for Forming Low Dielectric Constant Amorphous Silica-Based Coating Film, Method for Preparing the Same, and Low Dielectric Constant Amorphous Silica-Based Coating Film Obtained From the Same | 5 |
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