YOUNGCHANG CHEMICAL CO., LTD

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 145
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7615338 Photoresist coating composition and method for forming fine pattern using the sameDec 08, 05Nov 10, 09[G03C, G03F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2006/0147,834 Water-soluble composition for coating photoresist pattern and method for forming fine patterns using the sameAbandonedMay 04, 05Jul 06, 06[G03F]

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