VISTEC ELECTRON BEAM GMBH

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 4100
 
  
 
F16C SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OF CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS 367
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 343
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 3125
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 2204
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 145
 
  
 
H01G CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE 165

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0368,031 PARTICLE BEAM APPARATUS AND METHOD FOR OPERATING A PARTICLE BEAM APPARATUSJun 17, 16Dec 22, 16[H01J, B08B]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8614052 Method for controlling the electronic beam exposure of wafers and masks using proximity correctionJan 12, 11Dec 24, 13[H01J, G03F]
8529130 Aerostatic bearing arrangement and associated electrostatic preloading unit, particularly for vacuum applicationSep 03, 09Sep 10, 13[F16C]
8496221 Aerostatically guided table system for vacuum applicationNov 16, 09Jul 30, 13[F16C]
8267582 Table guided by aerostatic bearing elements for vacuum applicationApr 10, 09Sep 18, 12[F16C]
8148702 Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patternsDec 10, 09Apr 03, 12[H01J, G21K, G03F]
7741620 Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrateOct 25, 05Jun 22, 10[G21K]
7601969 Illumination condenser for a particle optical projection systemMar 03, 05Oct 13, 09[H01J]
7560713 Correction lens system for a particle beam projection deviceFeb 24, 05Jul 14, 09[H01J, G21K]
7332730 Device and method for imaging a multiple particle beam on a substrateNov 09, 05Feb 19, 08[G01N]
7241542 Process for controlling the proximity effect correctionJun 23, 05Jul 10, 07[G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7491946 Electrostatic deflection system for corpuscular radiationExpiredFeb 03, 06Feb 17, 09[H01J]
7435517 Method for reducing the fogging effectExpiredJun 23, 05Oct 14, 08[G03C]
2006/0121,396 Method for exposing a substrate with a beamAbandonedNov 29, 05Jun 08, 06[G03F]
6774375 Method and apparatus for forming a curved polyline on a radiation-sensitive resistExpiredMar 05, 01Aug 10, 04[B23K]
6600162 Method and device for exposing a substrate to lightExpiredSep 21, 00Jul 29, 03[H05H]

Top Inventors for This Owner

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