VERSUM MATERIALS US, LLC

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 147220
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 8131
 
  
 
C07F ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM 7415
 
  
 
C11D DETERGENT COMPOSITIONS 6022
 
  
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR3758
 
  
 
C09G POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES344
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 2731
 
  
 
B01D SEPARATION 23111
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 1749
 
  
 
C09D COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR 1775

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0047,898 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORYMar 08, 16Feb 15, 18[H01L]
2018/0033,614 Compositions and Methods Using Same for Carbon Doped Silicon Containing FilmsJul 19, 17Feb 01, 18[C23C, H01L]
2018/0022,691 High Purity Ethylenediamine for Semiconductor ApplicationsJul 13, 17Jan 25, 18[C07C, B08B, B01J, B65D]
2018/0023,994 ULTRASONIC LIQUID LEVEL SENSING SYSTEMNov 18, 15Jan 25, 18[G01F]
2017/0362,466 Chemical Mechanical Polishing (CMP) of Cobalt-Containing substrateJun 06, 17Dec 21, 17[B24B, C09K, H01L, C09G, C23F]
2017/0137,936 Vessel With FilterJan 30, 17May 18, 17[C23C, B01D]
2017/0022,612 Methods For Depositing Group 13 Metal or Metalloid Nitride FilmsJul 14, 16Jan 26, 17[C23C]
2016/0293,410 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF A BORON CONTAINING FILMSMar 24, 16Oct 06, 16[C23C, H01L, C07F]
2016/0293,479 Selectively Removing Titanium Nitride Hard Mask and Etch Residue RemovalMar 22, 16Oct 06, 16[H01L]
2016/0152,930 Stripping and Cleaning Compositions for Removal of Thick Film ResistFeb 08, 16Jun 02, 16[H01L, C11D]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9922818 Alkyl-alkoxysilacyclic compoundsJun 05, 15Mar 20, 18[C23C, H01L, H01B]
9905415 Methods for depositing silicon nitride filmsSep 26, 14Feb 27, 18[C23C, H01L, C07F]
9879340 Silicon-based films and methods of forming the sameOct 27, 15Jan 30, 18[C23C]
9873833 Etchant solutions and method of use thereofDec 22, 15Jan 23, 18[C09K, C03C, H01L, C23F, B44C, C25F]
9809711 Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor processJan 10, 13Nov 07, 17[H01L, C08G, C09D, B65B]
9796739 AZA-polysilane precursors and methods for depositing films comprising sameJun 02, 14Oct 24, 17[C23C, H01L, C07F]
9770804 Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufactureMar 18, 14Sep 26, 17[B24B]
9758534 Organoaminosilanes and methods for making sameDec 02, 15Sep 12, 17[C07F]
9738982 Divided electrochemical cell and low cost high purity hydride gas production processAug 10, 15Aug 22, 17[C23C, C25B]
9676966 Chemical mechanical polishing composition and processNov 13, 03Jun 13, 17[H01L, C03C, C09G]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0049,293 METHOD AND COMPOSITION FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMSAbandonedAug 07, 15Feb 18, 16[H01L]
2015/0140,790 Precursors For GST Films In ALD/CVD ProcessesAbandonedJan 23, 15May 21, 15[C23C, H01L]
2015/0104,940 BARRIER CHEMICAL MECHANICAL PLANARIZATION COMPOSITION AND METHOD THEREOFAbandonedOct 11, 13Apr 16, 15[H01L, C09G]
2014/0315,386 Metal Compound Coated Colloidal Particles Process for Making and Use ThereforAbandonedMar 25, 14Oct 23, 14[H01L, C09G, B01J]
2014/0273,458 Chemical Mechanical Planarization for Tungsten-Containing SubstratesAbandonedDec 27, 13Sep 18, 14[H01L, C09G]
2014/0242,795 Volatile Imidazoles and Group 2 Imidazole Based Metal PrecursorsAbandonedFeb 27, 14Aug 28, 14[H01L]
2014/0196,664 SYSTEM AND METHOD FOR TUNGSTEN HEXAFLUORIDE RECOVERY AND REUSEAbandonedJan 07, 14Jul 17, 14[C23C, H01L]
2014/0193,578 Splashguard and Inlet Diffuser for High Vacuum, High Flow Bubbler VesselAbandonedMar 12, 14Jul 10, 14[C23C]
2014/0183,706 Dielectric Films Comprising Silicon And Methods For Making SameAbandonedMar 11, 14Jul 03, 14[H01L]
2014/0110,267 Anodes for the Electrolytic Production of Nitrogen Trifluoride and FluorineAbandonedApr 09, 13Apr 24, 14[C25B]
2014/0110,269 Anodes for the Electrolytic Production of Nitrogen Trifluoride and FluorineAbandonedOct 04, 13Apr 24, 14[C25B]
2014/0100,151 Stripping and Cleaning Compositions for Removal of Thick Film ResistAbandonedOct 01, 13Apr 10, 14[G03F]
2014/0065,844 Amino Vinylsilane Precursors for Stressed SiN FilmsAbandonedNov 04, 13Mar 06, 14[H01L]
2014/0024,173 Method of Making a Multicomponent FilmAbandonedSep 20, 13Jan 23, 14[H01L]
2014/0008,240 Divided Electrochemical Cell and Low Cost High Purity Hydride Gas Production ProcessAbandonedDec 20, 12Jan 09, 14[C25B]
2013/0341,178 Method and Apparatus for Removing Contaminants from Nitrogen TrifluorideAbandonedJun 07, 13Dec 26, 13[B01D]
2013/0260,025 Group 2 Imidazolate Formulations for Direct Liquid InjectionAbandonedMar 22, 13Oct 03, 13[C09D]
2013/0260,575 SILICON PRECURSORS AND COMPOSITIONS COMPRISING SAME FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMSAbandonedFeb 22, 13Oct 03, 13[H01L]
2013/0247,971 Oxygen Containing Precursors for Photovoltaic PassivationAbandonedSep 11, 12Sep 26, 13[H01L]
2013/0243,968 CATALYST SYNTHESIS FOR ORGANOSILANE SOL-GEL REACTIONSAbandonedMar 12, 13Sep 19, 13[C09D]

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