VEECO INSTRUMENTS INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 6638
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 32330
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 23105
 
  
 
1303 EQUIPMENT FOR DISTRIBUTION OR CONTROL OF ELECTRIC POWER1655
 
  
 
C30B SINGLE-CRYSTAL GROWTH 1442
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 11195
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 7440
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 573
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 462
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 432

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0362,701 CENTRAL SOURCE DELIVERY FOR CHEMICAL VAPOR DEPOSITION SYSTEMSJun 05, 17Dec 21, 17[C23C]
2017/0256,434 WAFER HANDLING ASSEMBLYDec 13, 16Sep 07, 17[H01L]
2017/0191,157 KEYED WAFER CARRIERMar 21, 17Jul 06, 17[C23C, H01L]
2017/0121,847 WAFER CARRIER HAVING THERMAL UNIFORMITY-ENHANCING FEATURESJan 11, 17May 04, 17[C23C, C30B]
2017/0096,734 Rotating Disk Reactor With Ferrofluid Seal For Chemical Vapor DepositionDec 16, 16Apr 06, 17[C23C, H01L]
2017/0076,972 PLANETARY WAFER CARRIERSSep 15, 16Mar 16, 17[H01L]
2017/0067,163 MULTIPLE CHAMBER CHEMICAL VAPOR DEPOSITION SYSTEMAug 24, 16Mar 09, 17[C23C, H01L]
2017/0053,049 PROCESS-SPECIFIC WAFER CARRIER CORRECTION TO IMPROVE THERMAL UNIFORMITY IN CHEMICAL VAPOR DEPOSITION SYSTEMS AND PROCESSESAug 16, 16Feb 23, 17[C23C, G06F]
2016/0359,004 STRESS CONTROL FOR HETEROEPITAXYJun 03, 15Dec 08, 16[H01L]
2016/0168,710 Gas Injection System For Chemical Vapor Deposition Using Sequenced ValvesFeb 23, 16Jun 16, 16[C23C]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
D810705 Self-centering wafer carrier for chemical vapor depositionApr 01, 16Feb 20, 18[1303]
D806046 Wafer carrier with a multi-pocket configurationDec 16, 16Dec 26, 17[1303]
D803283 Wafer handling assemblyMay 16, 16Nov 21, 17[1509]
9816184 Keyed wafer carrierMar 20, 12Nov 14, 17[C23C, H01L]
9804126 Apparatus and method for improved acoustical transformationDec 05, 12Oct 31, 17[G10K, G01N]
9806183 Stress control on thin silicon substratesNov 30, 15Oct 31, 17[H01L]
9761671 Engineered substrates for use in crystalline-nitride based devicesDec 30, 14Sep 12, 17[H01L]
9748113 Method and apparatus for controlled dopant incorporation and activation in a chemical vapor deposition systemJul 30, 15Aug 29, 17[C23C, H01L]
D793971 Wafer carrier with a 14-pocket configurationMar 27, 15Aug 08, 17[1303]
D793972 Wafer carrier with a 31-pocket configurationMar 27, 15Aug 08, 17[1303]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0256,436 WAFER HANDLING ASSEMBLYAbandonedMar 01, 16Sep 07, 17[H01L, B25J]
2016/0289,819 HYDROXIDE FACILITATED OPTICAL FILMSAbandonedApr 02, 15Oct 06, 16[C23C]
2016/0178,819 SELF-FILTERED OPTICAL MONITORING OF NARROW BANDPASS FILTERSAbandonedDec 23, 14Jun 23, 16[G02B]
2016/0160,387 Linear Cluster Deposition SystemAbandonedJan 15, 16Jun 09, 16[H01L, C30B]
2015/0376,776 VARIABLE-TEMPERATURE MATERIAL GROWTH STAGES AND THIN FILM GROWTHAbandonedFeb 13, 14Dec 31, 15[C23C]
2015/0364,352 Wafer Loading and UnloadingAbandonedJun 11, 14Dec 17, 15[H01L]
2015/0034,476 DEPOSITION OF THICK MAGNETIZABLE FILMS FOR MAGNETIC DEVICESAbandonedJul 07, 14Feb 05, 15[H01J, C23C]
2014/0360,430 WAFER CARRIER HAVING THERMAL UNIFORMITY-ENHANCING FEATURESAbandonedJun 05, 14Dec 11, 14[C30B]
2014/0352,619 CHEMICAL VAPOR DEPOSITION WITH ELEVATED TEMPERATURE GAS INJECTIONAbandonedAug 20, 14Dec 04, 14[C23C]
2014/0341,796 DUAL-SIDE WAFER BAR GRINDINGAbandonedMay 20, 13Nov 20, 14[B24B]
2014/0326,186 METAL-ORGANIC VAPOR PHASE EPITAXY SYSTEM AND PROCESSAbandonedJul 16, 14Nov 06, 14[C30B]
2014/0133,950 Insertion/Extraction Tool For Components In HousingAbandonedNov 13, 12May 15, 14[B66F]
8562746 Sectional wafer carrierExpiredDec 15, 10Oct 22, 13[C23C, H01L, C23F]
2013/0263,895 CVD REACTOR CLEANING METHODS AND SYSTEMSAbandonedApr 06, 12Oct 10, 13[B08B]
2013/0206,583 Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle BeamAbandonedMar 14, 13Aug 15, 13[C23C]
2013/0167,769 TARGETED TEMPERATURE COMPENSATION IN CHEMICAL VAPOR DEPOSITION SYSTEMSAbandonedDec 29, 11Jul 04, 13[C30B]
2013/0122,252 ION BEAM DEPOSITION OF FLUORINE-BASED OPTICAL FILMSAbandonedNov 12, 12May 16, 13[G02B]
2013/0065,403 WAFER CARRIER WITH THERMAL FEATURESAbandonedNov 09, 12Mar 14, 13[H01L, B65D]
2013/0037,725 GRID PROVIDING BEAMLET STEERINGAbandonedOct 19, 12Feb 14, 13[H01J]
2012/0272,892 Metal-Organic Vapor Phase Epitaxy System and ProcessAbandonedApr 06, 12Nov 01, 12[C30B]

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