VEECO ALD INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 2279
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 10352
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 285
 
  
 
1509 MACHINE TOOLS, ABRADING AND FOUNDING MACHINERY227
 
  
 
C07F ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM 169
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135
 
  
 
C30B SINGLE-CRYSTAL GROWTH 155
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 1127
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 1110

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0107,614 Multi-Step Atomic Layer Deposition Process for Silicon Nitride Film FormationOct 12, 16Apr 20, 17[C23C]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9556514 Spatial deposition of material using short-distance reciprocating motionsJan 23, 15Jan 31, 17[C23C]
9558963 Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiationSep 29, 15Jan 31, 17[C23C, H01J, H01L]
9546423 Cleaning of deposition device by injecting cleaning gas into deposition deviceMar 11, 15Jan 17, 17[C23C, H01J]
9435030 Radical reactor with inverted orientationApr 29, 13Sep 06, 16[C23C, H01J]
9376455 Molecular layer deposition using reduction processNov 18, 14Jun 28, 16[C23C, C07F, B05D]
9177788 Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiationFeb 21, 13Nov 03, 15[C23C, H01J, H01L]
9163310 Enhanced deposition of layer on substrate using radicalsFeb 15, 12Oct 20, 15[C23C, B05D, H05H]
9145608 Scanning injector assembly module for processing substrateMar 23, 13Sep 29, 15[C23C]
9129913 Formation of barrier layer on device using atomic layer depositionOct 18, 11Sep 08, 15[C23C, H01L]
D732092 Gas injection plateMar 19, 14Jun 16, 15[1509]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0032,452 Atomic Layer Deposition Method Using Source Precursor Transformed by Hydrogen Radical ExposureAbandonedJul 24, 15Feb 04, 16[C23C]
2016/0002,783 ENHANCED DEPOSITION OF LAYER ON SUBSTRATE USING RADICALSAbandonedSep 15, 15Jan 07, 16[C23C]
2015/0360,242 Linear Deposition Apparatus with Modular AssemblyAbandonedJun 11, 14Dec 17, 15[B05B]
2015/0361,548 Injection Assembly in Linear Deposition Apparatus with Bulging Ridges Extending along Bottom OpeningsAbandonedJun 12, 14Dec 17, 15[C23C]
2015/0299,857 DEPOSITION DEVICE WITH AUXILIARY INJECTORS FOR INJECTING NUCLEOPHILE GAS AND SEPARATION GASAbandonedApr 16, 15Oct 22, 15[C23C]
2015/0275,365 Atomic Layer Deposition Using Injector Module ArraysAbandonedMar 20, 15Oct 01, 15[C23C]
2015/0159,271 DEPOSITION OF NON-ISOSTRUCTURAL LAYERS FOR FLEXIBLE SUBSTRATEAbandonedDec 05, 14Jun 11, 15[C23C]
2015/0104,574 FAST ATOMIC LAYER DEPOSITION PROCESS USING SEED PRECURSORAbandonedOct 14, 14Apr 16, 15[C23C]
2015/0086,716 PRINTING OF COLORED PATTERN USING ATOMIC LAYER DEPOSITIONAbandonedSep 23, 14Mar 26, 15[C23C]
2015/0020,737 Atomic Layer Deposition Using Radicals Of Gas MixtureAbandonedOct 01, 14Jan 22, 15[C23C]
2014/0366,804 Performing Atomic Layer Deposition on Large Substrate Using Scanning ReactorsAbandonedJun 06, 14Dec 18, 14[C23C]
2014/0319,488 THIN FILM FORMATION FOR DEVICE SENSITIVE TO ENVIRONMENTAbandonedApr 09, 14Oct 30, 14[H01L]
2014/0219,905 VAPOR DEPOSITION REACTOR AND METHOD FOR FORMING THIN FILMAbandonedApr 04, 14Aug 07, 14[C23C, C01B]
2014/0205,769 CASCADED PLASMA REACTORAbandonedJan 14, 14Jul 24, 14[C23C]
2014/0174,358 Magnetic Field Assisted DepositionAbandonedFeb 28, 14Jun 26, 14[C23C]
2014/0141,191 Hydrophobic and Oleophobic Encapsulation Material with Alternating LayersAbandonedOct 11, 13May 22, 14[H01L, C09D, H01G]
2014/0073,212 Textile Including Fibers Deposited with Material Using Atomic Layer Deposition for Increased Rigidity and StrengthAbandonedNov 12, 13Mar 13, 14[D06M]
2014/0065,307 COOLING SUBSTRATE AND ATOMIC LAYER DEPOSITION APPARATUS USING PURGE GASAbandonedAug 13, 13Mar 06, 14[B05C, B05D]
2014/0037,846 ENHANCING DEPOSITION PROCESS BY HEATING PRECURSORAbandonedJul 16, 13Feb 06, 14[B05C, B05D]
2014/0037,853 DEPOSITING THIN LAYER OF MATERIAL ON PERMEABLE SUBSTRATEAbandonedOct 15, 13Feb 06, 14[B05D]

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