UNAXIS BALZERS AG

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1586
 
  
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 243
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 285
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
B23Q DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING 139
 
  
 
B25B TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING, OR HOLDING143
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM1156
 
  
 
B65G TRANSPORT OR STORAGE DEVICES, e.g. CONVEYERS FOR LOADING OR TIPPING; SHOP CONVEYER SYSTEMS; PNEUMATIC TUBE CONVEYERS 166
 
  
 
B65H HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES178
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7033471 Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambersAug 17, 04Apr 25, 06[C23C]
6899795 Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambersJan 18, 00May 31, 05[C23C]
6835414 Method for producing coated substratesOct 25, 01Dec 28, 04[C23C]
6821397 Method for controlling plasma density or the distribution thereofAug 22, 02Nov 23, 04[C23C]
6814838 Vacuum treatment chamber and method for treating surfacesMar 29, 01Nov 09, 04[C23C]
6790482 Arrangement for orienting the magnetization direction of magnetic layersJan 03, 03Sep 14, 04[C23C, B05C]
6619131 Combination pressure sensor with capacitive and thermal elementsMar 14, 02Sep 16, 03[G01L]
6527927 Vacuum treatment systemJun 05, 00Mar 04, 03[C23C]
6511543 Holding deviceAug 24, 00Jan 28, 03[B23Q, B05C]
6481955 Vacuum treatment equipmentNov 15, 01Nov 19, 02[C23C, H01L, B65H, C23F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2007/0105,400 Method and apparatus for control of layer thicknessesAbandonedNov 08, 05May 10, 07[B05C, H01L]
2007/0009,670 Sputter method or device for the production of natural voltage optimized coatingsAbandonedApr 30, 03Jan 11, 07[B05D]
2006/0150,903 Method and apparatus for processing substratesAbandonedOct 15, 03Jul 13, 06[C23C, B05C]
2005/0172,983 Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamberAbandonedJun 23, 03Aug 11, 05[B08B]
2005/0028,737 Installation and method for vacuum treatment or powder productionAbandonedJan 16, 04Feb 10, 05[C23C]
6841048 Coating apparatus for disk-shaped workpiecesExpiredJul 01, 03Jan 11, 05[C23C, B05C]
6818108 Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpieceExpiredJul 17, 01Nov 16, 04[C23C, H01L]
6776881 Magnetron atomization source and method of use thereofExpiredSep 25, 02Aug 17, 04[C23C]
2004/0096,583 Method for vacuum treatment of workpieces and vacuum treatment installationAbandonedNov 13, 03May 20, 04[B05D]
6730194 Method for manufacturing disk-shaped workpieces with a sputter stationExpiredMay 23, 02May 04, 04[C23C]
6669170 Vacuum valveExpiredMay 23, 01Dec 30, 03[F16K]
6669987 Method for vacuum treatment of workpieces and vacuum treatment facilityExpiredJan 22, 02Dec 30, 03[C23C]
6656330 Coating installation for disk-form workpiecesExpiredJun 21, 01Dec 02, 03[C23C, B05D]
2003/0070,608 Method for producing components and ultrahigh vacuum CVD reactorAbandonedOct 12, 01Apr 17, 03[C30B]
6540883 Magnetron sputtering source and method of use thereofExpiredFeb 03, 99Apr 01, 03[C23C]
2003/0051,792 Use of a cleaning process, a cleaning process, a connection process and a workpiece pairAbandonedOct 16, 02Mar 20, 03[B32B]
6506288 Optical film material especially TiO2 or Ta2O5 optical waveguide layer and method for producing suchExpiredAug 26, 96Jan 14, 03[C23C]
6507145 Ballast layer for field emissive deviceExpiredFeb 03, 00Jan 14, 03[H01J]
6503351 Use of a cleaning process, a cleaning process, a connection process and a workpiece pairExpiredDec 05, 00Jan 07, 03[B32B]
6474172 Method for measuring the gas pressure in a container, and devices for its applicationExpiredMay 10, 00Nov 05, 02[G01L]

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