Tama Chemicals Co., Ltd.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
B01D SEPARATION 1133
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 165
 
  
 
C02F TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE 154
 
  
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 1137
 
  
 
C07F ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM 169
 
  
 
C08G MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 1119
 
  
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR194
 
  
 
C25B ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON- METALS; APPARATUS THEREFOR 134

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8206573 Electrode for electrolysis and method for producing aqueous solution of quaternary ammonium hydroxide using the sameSep 08, 05Jun 26, 12[C25B]
6861010 COPPER-BASED METAL POLISHING COMPOSITION, METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE, POLISHING COMPOSITION, ALUMINUM-BASED METAL POLISHING COMPOSITION, AND TUNGSTEN-BASED METAL POLISHING COMPOSITIONApr 18, 02Mar 01, 05[C09K, H01L]
6426294 COPPER-BASED METAL POLISHING COMPOSITION, METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE, POLISHING COMPOSITION, ALUMINUM-BASED METAL POLISHING COMPOSITION, AND TUNGSTEN-BASED METAL POLISHING COMPOSITIONOct 01, 99Jul 30, 02[H01L]
6315644 Apparatus and process for supplying abrasives for use in the manufacture of semiconductorsNov 22, 99Nov 13, 01[B24B]
5783609 Process for recovering organoalkoxysilane from polyorganosiloxaneJun 27, 96Jul 21, 98[C08G]
5545309 Method of processing organic quaternary ammonium hydroxide-containing waste liquidMay 11, 95Aug 13, 96[C02F]
5534649 Process for preparing dialkyl carbonatesDec 29, 94Jul 09, 96[C07C]
5439564 Method of processing organic quaternary ammonium hydroxide-containing waste liquidNov 10, 93Aug 08, 95[B01D]
5103034 Process for preparing alkoxysilanesMar 19, 91Apr 07, 92[C07F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0174,868 METHOD FOR PURIFYING ALKALINE TREATMENT FLUID FOR SEMICONDUCTOR SUBSTRATE AND A PURIFICATION APPARATUSAbandonedSep 26, 11Jul 11, 13[B01J]
2009/0317,624 UNIFORMLY DISPERSED PHOTOCATALYST COATING LIQUID, METHOD FOR PRODUCING SAME, AND PHOTOCATALYTICALLY ACTIVE COMPOSITE MATERIAL OBTAINED BY USING SAMEAbandonedFeb 19, 07Dec 24, 09[B32B, C08K]
2007/0094,936 Abrasive slurry having high dispersion stability and manufacturing method for a substrateAbandonedOct 31, 06May 03, 07[B24D]
6896927 Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewithExpiredDec 13, 02May 24, 05[B05D]
2004/0221,516 Abrasive slurry having high dispersion stability and manufacturing method for a substrateAbandonedFeb 18, 04Nov 11, 04[B24D]
4931578 Process for the production of trialkoxysilanesExpiredFeb 22, 88Jun 05, 90[C07F]
4900984 Cathode ray tube with antistatic film on front panelExpiredApr 27, 88Feb 13, 90[H01J]
4892625 Method for producing high purity chemicalsExpiredJun 23, 87Jan 09, 90[B01D]
4873120 Method of manufacturing cathode-ray tubeExpiredDec 23, 87Oct 10, 89[B05D]
4806329 Method of producing granular synthetic silicaExpiredSep 04, 86Feb 21, 89[C01B]
4634509 Method for production of aqueous quaternary ammonium hydroxide solutionExpiredJan 24, 86Jan 06, 87[C25D]
4572769 Method of manufacturing tetramethyl ammonium hydroxideExpiredOct 26, 84Feb 25, 86[C25C]

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