TOYO GOSEI CO., LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 3122
 
  
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 1137
 
  
 
C07D HETEROCYCLIC COMPOUNDS 1161
 
  
 
G02F DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS 1132
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9223210 Photosensitive compound, photosensitive resin, and photosensitive compositionFeb 28, 13Dec 29, 15[C08F, C07D, C07C, G03F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0376,438 COMPOUNDERS FOR ENHANCING GENERATION OF CHEMICAL SPECIESAbandonedJun 25, 15Dec 31, 15[H01L, C09D]
2014/0335,304 RESIN, METHOD FOR FABRICATING RESIN, AND COMPOSITIONAbandonedMay 09, 14Nov 13, 14[C08F]
6444391 Photosensitive compositions and pattern formation methodExpiredJan 02, 01Sep 03, 02[G03F]
6342330 Photosensitive compositions and pattern formation methodExpiredJan 02, 01Jan 29, 02[G03F]
5965320 Positive photoresist composition containing phenol ester of 1,2-napthoquinone-(2)-diazide-6-sulfonic acid and pattern formation method using the compositionExpiredSep 07, 93Oct 12, 99[G03F]
5866296 Photosensitive resin compositionExpiredApr 25, 97Feb 02, 99[G03F]
5639579 Photosensitive colored resin composition, colored image formation method of color filter, and formation method of black matrixExpiredJun 07, 95Jun 17, 97[G03F]
5589315 Photosensitive compositions comprising photosensitive polyfunctional aromatic diazo compounds, and presensitized lithographic plates formed with the sameExpiredJan 06, 95Dec 31, 96[G03C, G03F]
5459011 Liquid or paste photosensitive composition containg aromatic diazo compound and lactic acid, hydroxyacetic acid or mixture thereofExpiredFeb 27, 95Oct 17, 95[G03F]

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