TOKYO OHKA KOGYO CO., LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 5006
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 101262
 
 
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 7058
 
 
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 5880
 
 
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 5510
 
 
 
C09D COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR 5243
 
 
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 4443
 
 
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM44113
 
 
 
C08L COMPOSITIONS OF MACROMOLECULAR COMPOUNDS 3086
 
 
 
C07D HETEROCYCLIC COMPOUNDS 27135

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0072,564 RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTUREJul 18, 17Mar 15, 18[B05D, C08F, B81C]
2018/0021,738 GAS-PERMEABLE MEMBRANEJul 11, 17Jan 25, 18[C08G, C08L, B01D]
2017/0349,877 CELL CULTURE SUBSTRATE FOR TRAIT INDUCTION OF NERVE CELL, METHOD OF CONTROLLING TRAIT OF NERVE CELL, METHOD OF EXTENDING NEURITE, METHOD OF CONTROLLING DOPAMINE SECRETION, AND METHOD OF CONTROLLING ACETYLCHOLINESTERASE ACTIVITYJun 01, 17Dec 07, 17[C12N]
2017/0349,881 TRAIT INDUCTION METHOD OF UNDIFFERENTIATED CELLSJun 01, 17Dec 07, 17[C12N]
2017/0349,882 CELL CULTURE SUBSTRATE FOR TRAIT INDUCTION CONTROL OF MACROPHAGE AND METHOD OF CONTROLLING TRAIT OF MACROPHAGEJun 01, 17Dec 07, 17[C12N]
2017/0326,850 LAMINATE PRODUCTION METHOD, SUBSTRATE PROCESSING METHOD, AND LAMINATEOct 29, 15Nov 16, 17[C09J, H01L, B32B]
2017/0322,489 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITIONApr 27, 17Nov 09, 17[C23C, G03F]
2017/0306,169 HOMOGENEOUS COATING SOLUTION AND PRODUCTION METHOD THEREOF, LIGHT-ABSORBING LAYER OF SOLAR CELL AND PRODUCTION METHOD THEREOF, AND SOLAR CELL AND PRODUCTION METHOD THEREOFOct 27, 15Oct 26, 17[H01L, C09D, C01G]
2017/0279,101 SEPARATOR FOR METAL SECONDARY BATTERIESAug 27, 15Sep 28, 17[H01M]
2017/0266,694 SURFACE TREATMENT METHOD, ANTI-STATIC AGENT, AND HYDROPHILIZING TREATMENT AGENTMar 15, 17Sep 21, 17[B05D, C09D]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9920286 Cleaning liquid for lithography and method for forming wiringMar 29, 16Mar 20, 18[H01L, B08B, G03F, C11D]
9914687 Composition containing vinyl-group-containing compoundMar 28, 14Mar 13, 18[C08F, C07C, G03F, C08L]
9914847 Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureJun 17, 16Mar 13, 18[B05D, C09D, B01J]
9911637 Overlapping device, and overlapping methodApr 30, 13Mar 06, 18[H01L, G06T, G06K]
9911955 Method for producing porous polyimide film, porous polyimide film and separator using sameOct 26, 16Mar 06, 18[H01M, B01D]
9902675 Vinyl-group-containing fluorene compoundMar 28, 14Feb 27, 18[C07C, G03F]
9890233 Resist composition, method of forming resist pattern, and polymeric compoundJan 14, 15Feb 13, 18[C08F, G03F]
9890250 Method for producing polybenzoxazole resinMay 19, 15Feb 13, 18[C08G]
9891527 Developing solution and development processing method of photosensitive resin compositionJan 30, 14Feb 13, 18[G03F]
9881829 Adhesive composition, laminate, and stripping methodFeb 06, 17Jan 30, 18[C09J, H01L, B32B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0306,278 CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAMEAbandonedMar 31, 16Oct 20, 16[G03F]
2015/0184,047 METHOD FOR MODIFYING SUBSTRATE SURFACE, MODIFYING FILM AND COATING SOLUTION USED FOR MODIFICATION OF SUBSTRATE SURFACEAbandonedAug 27, 13Jul 02, 15[C09K, B05D]
2015/0093,507 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, AND BLOCK COPOLYMER COMPOSITIONAbandonedSep 23, 14Apr 02, 15[C09D]
8956810 Primer and pattern forming method for layer including block copolymerWithdrawnSep 12, 11Feb 17, 15[C09D, G03F, C08L, C08K]
2014/0370,451 HEATING APPARATUS AND HEATING METHODAbandonedJun 18, 13Dec 18, 14[H01L]
2014/0363,903 SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATEAbandonedJun 10, 13Dec 11, 14[H01L]
2014/0242,284 COATING APPARATUS AND COATING METHODAbandonedFeb 24, 14Aug 28, 14[B05D, B05B]
2014/0220,492 RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERNAbandonedFeb 03, 14Aug 07, 14[G03F]
2014/0221,649 NOVEL COMPOUNDAbandonedJun 15, 12Aug 07, 14[G03F]
2014/0186,769 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOLECULAR WEIGHT COMPOUNDAbandonedDec 10, 13Jul 03, 14[G03F]
2014/0162,193 RESIST COMPOSITION FOR EUV, METHOD OF PRODUCING RESIST COMPOSITION FOR EUV, AND METHOD OF FORMING RESIST PATTERNAbandonedFeb 11, 14Jun 12, 14[G03F]
2014/0147,787 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERNAbandonedNov 19, 13May 29, 14[G03F]
2014/0127,626 RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT WHICH IS USED FOR FORMATION OF GUIDE PATTERN, GUIDE PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN ON LAYER CONTAINING BLOCK COPOLYMERAbandonedOct 05, 11May 08, 14[G03F]
2014/0117,293 COATING SOLUTION FOR FORMING LIGHT-ABSORBING LAYER, AND METHOD OF PRODUCING COATING SOLUTION FOR FORMING LIGHT-ABSORBING LAYERAbandonedOct 29, 12May 01, 14[H01L]
2014/0093,824 RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERNAbandonedOct 01, 13Apr 03, 14[G03F]
8667924 Coating device and nozzle managing methodExpiredJun 25, 10Mar 11, 14[B05C, B05B]
2014/0017,407 Coating deviceAbandonedSep 09, 13Jan 16, 14[B05C]
2014/0008,420 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUSAbandonedJul 09, 12Jan 09, 14[C23C, B05C, B05D, B23K]
8617655 Coating device and coating methodExpiredMay 10, 10Dec 31, 13[B05D]
2013/0337,387 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERNAbandonedApr 23, 13Dec 19, 13[G03F]

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