TOKYO OHKA KOGYO CO., LTD.
Patent Owner
Stats
- 757 US PATENTS IN FORCE
- 43 US APPLICATIONS PENDING
- Mar 20, 2018 most recent publication
Details
- 757 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 11,895 Total Citation Count
- Jun 16, 1978 Earliest Filing
- 467 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
2018/0072,564 RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD FOR PRODUCING STRUCTURE INCLUDING PHASE-SEPARATED STRUCTUREJul 18, 17Mar 15, 18[B05D, C08F, B81C]
2017/0349,877 CELL CULTURE SUBSTRATE FOR TRAIT INDUCTION OF NERVE CELL, METHOD OF CONTROLLING TRAIT OF NERVE CELL, METHOD OF EXTENDING NEURITE, METHOD OF CONTROLLING DOPAMINE SECRETION, AND METHOD OF CONTROLLING ACETYLCHOLINESTERASE ACTIVITYJun 01, 17Dec 07, 17[C12N]
2017/0349,882 CELL CULTURE SUBSTRATE FOR TRAIT INDUCTION CONTROL OF MACROPHAGE AND METHOD OF CONTROLLING TRAIT OF MACROPHAGEJun 01, 17Dec 07, 17[C12N]
2017/0326,850 LAMINATE PRODUCTION METHOD, SUBSTRATE PROCESSING METHOD, AND LAMINATEOct 29, 15Nov 16, 17[C09J, H01L, B32B]
2017/0322,489 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITIONApr 27, 17Nov 09, 17[C23C, G03F]
2017/0306,169 HOMOGENEOUS COATING SOLUTION AND PRODUCTION METHOD THEREOF, LIGHT-ABSORBING LAYER OF SOLAR CELL AND PRODUCTION METHOD THEREOF, AND SOLAR CELL AND PRODUCTION METHOD THEREOFOct 27, 15Oct 26, 17[H01L, C09D, C01G]
2017/0266,694 SURFACE TREATMENT METHOD, ANTI-STATIC AGENT, AND HYDROPHILIZING TREATMENT AGENTMar 15, 17Sep 21, 17[B05D, C09D]
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9920286 Cleaning liquid for lithography and method for forming wiringMar 29, 16Mar 20, 18[H01L, B08B, G03F, C11D]
9914687 Composition containing vinyl-group-containing compoundMar 28, 14Mar 13, 18[C08F, C07C, G03F, C08L]
9914847 Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureJun 17, 16Mar 13, 18[B05D, C09D, B01J]
9911955 Method for producing porous polyimide film, porous polyimide film and separator using sameOct 26, 16Mar 06, 18[H01M, B01D]
9890233 Resist composition, method of forming resist pattern, and polymeric compoundJan 14, 15Feb 13, 18[C08F, G03F]
9891527 Developing solution and development processing method of photosensitive resin compositionJan 30, 14Feb 13, 18[G03F]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2016/0306,278 CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAMEAbandonedMar 31, 16Oct 20, 16[G03F]
2015/0184,047 METHOD FOR MODIFYING SUBSTRATE SURFACE, MODIFYING FILM AND COATING SOLUTION USED FOR MODIFICATION OF SUBSTRATE SURFACEAbandonedAug 27, 13Jul 02, 15[C09K, B05D]
2015/0093,507 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, AND BLOCK COPOLYMER COMPOSITIONAbandonedSep 23, 14Apr 02, 15[C09D]
8956810 Primer and pattern forming method for layer including block copolymerWithdrawnSep 12, 11Feb 17, 15[C09D, G03F, C08L, C08K]
2014/0363,903 SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATEAbandonedJun 10, 13Dec 11, 14[H01L]
2014/0220,492 RESIST COMPOSITION, POLYMERIC COMPOUND, COMPOUND AND METHOD OF FORMING RESIST PATTERNAbandonedFeb 03, 14Aug 07, 14[G03F]
2014/0186,769 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND HIGH-MOLECULAR WEIGHT COMPOUNDAbandonedDec 10, 13Jul 03, 14[G03F]
2014/0162,193 RESIST COMPOSITION FOR EUV, METHOD OF PRODUCING RESIST COMPOSITION FOR EUV, AND METHOD OF FORMING RESIST PATTERNAbandonedFeb 11, 14Jun 12, 14[G03F]
2014/0147,787 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERNAbandonedNov 19, 13May 29, 14[G03F]
2014/0127,626 RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT WHICH IS USED FOR FORMATION OF GUIDE PATTERN, GUIDE PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN ON LAYER CONTAINING BLOCK COPOLYMERAbandonedOct 05, 11May 08, 14[G03F]
2014/0117,293 COATING SOLUTION FOR FORMING LIGHT-ABSORBING LAYER, AND METHOD OF PRODUCING COATING SOLUTION FOR FORMING LIGHT-ABSORBING LAYERAbandonedOct 29, 12May 01, 14[H01L]
2014/0093,824 RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERNAbandonedOct 01, 13Apr 03, 14[G03F]
2014/0008,420 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUSAbandonedJul 09, 12Jan 09, 14[C23C, B05C, B05D, B23K]
2013/0337,387 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERNAbandonedApr 23, 13Dec 19, 13[G03F]
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