SUMCO CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 221177
 
  
 
C30B SINGLE-CRYSTAL GROWTH 1583
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 2937
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 27179
 
  
 
C03B MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL 2028
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1586
 
  
 
C03C CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS852
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 7152
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM6151
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 553

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0045,639 VITREOUS SILICA CRUCIBLE AND EVALUATION METHOD OF THE SAMEOct 13, 17Feb 15, 18[C03C, H04N, G01L, G01N, C30B]
2018/0038,797 METHOD OF EVALUATING SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATEDec 16, 15Feb 08, 18[H01L, G01N, H01T]
2017/0327,966 METHOD FOR PRODUCING SINGLE CRYSTALNov 17, 15Nov 16, 17[C30B]
2017/0292,204 MANUFACTURING METHOD AND MANUFACTURING SYSTEM FOR SILICON SINGLE CRYSTALSep 24, 15Oct 12, 17[C30B]
2017/0256,668 SEMICONDUCTOR EPITAXIAL WAFER AND METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING SOLID-STATE IMAGE SENSING DEVICEMay 21, 15Sep 07, 17[H01L]
2017/0067,181 PRODUCTION METHOD OF EPITAXIAL SILICON WAFER, VAPOR DEPOSITION EQUIPMENT AND VALVESep 02, 16Mar 09, 17[C23C, H01L, C30B]
2016/0289,862 VITREOUS SILICA CRUCIBLE AND METHOD FOR MANUFACTURING THE SAMEDec 25, 14Oct 06, 16[C03B, C30B]
2016/0207,161 METHOD OF POLISHING WAFER AND WAFER POLISHING APPARATUSJun 24, 14Jul 21, 16[B24B]
2016/0181,311 METHOD OF PRODUCING SEMICONDUCTOR EPITAXIAL WAFER, SEMICONDUCTOR EPITAXIAL WAFER, AND METHOD OF PRODUCING SOLID-STATE IMAGE SENSING DEVICENov 11, 13Jun 23, 16[H01L]
2016/0181,312 METHOD OF PRODUCING SEMICONDUCTOR EPITAXIAL WAFER, SEMICONDUCTOR EPITAXIAL WAFER, AND METHOD OF PRODUCING SOLID-STATE IMAGE SENSING DEVICENov 12, 13Jun 23, 16[H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9919402 Method of polishing wafer and wafer polishing apparatusJun 24, 14Mar 20, 18[B24B, H01L]
9903044 Silicon single crystal producing methodOct 31, 14Feb 27, 18[C30B]
9905481 Method of evaluating metal contamination in boron-doped P-type silicon wafer, device of evaluating metal contamination in boron-doped P-type silicon wafer, and method of manufacturing boron-doped P-type silicon waferAug 27, 15Feb 27, 18[H01L, G01R]
9881783 Method for processing semiconductor waferFeb 04, 14Jan 30, 18[B24B, H01L, B28D]
9863059 Method for pulling silicon single crystalJun 29, 13Jan 09, 18[C30B]
9863061 Vitreous silica crucible and method for manufacturing the sameDec 25, 14Jan 09, 18[C03B, C30B]
9847370 Method of producing semiconductor epitaxial wafer, semiconductor epitaxial wafer, and method of producing solid-state image sensing deviceSep 23, 16Dec 19, 17[H01L]
9842779 Method of evaluating metal contamination in semiconductor wafer and method of manufacturing semiconductor waferJan 24, 14Dec 12, 17[H01L, G06F]
9816199 Method of manufacturing single crystalDec 10, 15Nov 14, 17[G06T, C30B]
9816917 Vitreous silica crucible and distortion-measuring apparatus for the sameDec 25, 14Nov 14, 17[C03C, H04N, G01L, G01N, C30B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0087,049 EPITAXIAL SILICON WAFERAbandonedSep 16, 15Mar 24, 16[H01L]
2014/0238,487 WAFER FOR SOLAR CELL, METHOD OF PRODUCING WAFER FOR SOLAR CELL, METHOD OF PRODUCING SOLAR CELL, AND METHOD OF PRODUCING SOLAR CELL MODULEAbandonedSep 24, 12Aug 28, 14[H01L]
8629044 Method of producing silicon wafer, epitaxial wafer and solid state image sensor, and device for producing silicon waferWithdrawnJan 28, 11Jan 14, 14[H01L]
2013/0186,144 ELECTROMAGNETIC CASTING METHOD OF SILICON INGOTAbandonedMar 11, 13Jul 25, 13[H01L]
2013/0109,180 METHOD FOR POLISHING SILICON WAFER, AND POLISHING SOLUTION FOR USE IN THE METHODAbandonedJul 06, 11May 02, 13[H01L]
2013/0095,660 METHOD FOR POLISHING SILICON WAFERAbandonedJul 01, 11Apr 18, 13[H01L]
2013/0012,008 METHOD OF PRODUCING SOI WAFERAbandonedMar 23, 11Jan 10, 13[H01L]
2012/0329,204 WAFER FOR BACKSIDE ILLUMINATION TYPE SOLID IMAGING DEVICE, PRODUCTION METHOD THEREOF AND BACKSIDE ILLUMINATION SOLID IMAGING DEVICEAbandonedAug 13, 12Dec 27, 12[H01L]
2012/0315,739 MANUFACTURING METHOD FOR SEMICONDUCTOR WAFERAbandonedFeb 16, 11Dec 13, 12[H01L]
2012/0270,167 COVER FOR VITREOUS SILICA CRUCIBLE AND VITREOUS SILICA CRUCIBLE AND METHOD OF HANDLING THE SAMEAbandonedJun 01, 10Oct 25, 12[F27B, B65D]
8293070 Oxygen ion implantation equipmentExpiredMar 12, 09Oct 23, 12[C23C]
8222124 Method for manufacturing SIMOX wafer and SIMOX waferExpiredJun 24, 10Jul 17, 12[H01L]
2012/0167,623 METHOD AND APPARATUS FOR MANUFACTURING VITREOUS SILICA CRUCIBLEAbandonedDec 22, 11Jul 05, 12[C03B]
2012/0149,177 METHOD OF PRODUCING EPITAXIAL SILICON WAFERAbandonedAug 06, 10Jun 14, 12[H01L]
2012/0122,316 METHOD FOR SURFACE TREATMENT OF A WAFERAbandonedJul 27, 10May 17, 12[H01L]
8153450 Method for manufacturing SIMOX waferExpiredJan 28, 10Apr 10, 12[H01L]
2012/0049,330 SILICON WAFER AND METHOD FOR PRODUCING THE SAMEAbandonedApr 09, 10Mar 01, 12[H01L]
2012/0034,147 METHOD FOR CLEANING SILICON SLUDGEAbandonedApr 19, 10Feb 09, 12[C01B]
8110486 Method of manufacturing semiconductor wafer by forming a strain relaxation SiGe layer on an insulating layer of SOI waferExpiredJan 05, 07Feb 07, 12[H01L]
2011/0300,371 EPITAXIAL SUBSTRATE AND METHOD FOR PRODUCING SAMEAbandonedMay 02, 11Dec 08, 11[C30B, B32B]

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