SPEEDFAM-IPEC CORPORATION
Patent Owner
Stats
- 10 US PATENTS IN FORCE
- 1 US APPLICATIONS PENDING
- Jan 01, 2008 most recent publication
Details
- 10 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 4,463 Total Citation Count
- Aug 30, 1978 Earliest Filing
- 135 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
2002/0023,719 Method and apparatus for removing a material layer from a substrateAug 30, 01Feb 28, 02[H01L]
Recent Patents
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2005/0070,205 INTEGRATED PRESSURE CONTROL SYSTEM FOR WORKPIECE CARRIERAbandonedSep 30, 03Mar 31, 05[B24B]
2003/0046,783 Polyvinyl acetate sponge and method for producing sameAbandonedSep 10, 01Mar 13, 03[B32B]
2003/0045,008 Method and apparatus for monitoring changes in the surface of a workpiece during processingAbandonedAug 31, 01Mar 06, 03[H01L, G01R, C23F]
2002/0191,197 Method and apparatus for optical multi-angle endpoint detection during chemical mechanical planarizationAbandonedJun 14, 01Dec 19, 02[G01B]
2002/0170,574 Differential Cleaning for semiconductor wafers with copper circuitryAbandonedMay 21, 01Nov 21, 02[B08B]
2002/0173,237 Apparatus and method for planarizing a workpiece and a workpiece handling wand for use in the methodAbandonedMay 16, 01Nov 21, 02[B24B]
2002/0166,569 Method and apparatus for semiconductor wafer cleaningAbandonedMay 10, 01Nov 14, 02[H01L, B08B]
2002/0155,795 Optical endpoint detection for buff module on CMP toolAbandonedApr 24, 01Oct 24, 02[B24B]
2002/0151,255 Chemical mechanical polishing method and apparatus for removing material from a surface of a workpiece that includes low-k materialAbandonedApr 17, 01Oct 17, 02[B24B]
2002/0145,728 Method and apparatus for a spectrally stable light source using white light LEDsAbandonedApr 06, 01Oct 10, 02[G01J]
2002/0124,730 Method and apparatus for separating liquid in a semiconductor cleaning deviceAbandonedMar 08, 01Sep 12, 02[B01D]
2002/0098,784 Abrasive free polishing in copper damascene applicationsAbandonedJan 19, 01Jul 25, 02[B24B]
2002/0099,465 Methods and apparatus for facilitating communication between devices via an industrial networkAbandonedJan 19, 01Jul 25, 02[G06F]
6415803 Method and apparatus for semiconductor wafer cleaning with reuse of chemicalsExpiredNov 05, 99Jul 09, 02[B08B]
2002/0081,948 Flexible bending member for a workpiece carrier apparatusAbandonedDec 26, 00Jun 27, 02[B24B]
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