SILICON VALLEY GROUP, THERMAL SYSTEMS LLC

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 398
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM1156

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6660391 Low .kappa. dielectric inorganic/organic hybrid films and method of makingJul 27, 99Dec 09, 03[B32B]
6200389 Single body injector and deposition chamberJul 10, 98Mar 13, 01[C23C]
6056824 Free floating shield and semiconductor processing systemNov 03, 98May 02, 00[C23C]
5935647 Method of manufacturing an injector for chemical vapor deposition processingJun 04, 97Aug 10, 99[C23C]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2002/0134,507 Gas delivery metering tubeAbandonedJul 13, 01Sep 26, 02[C23C, C23F]
2001/0047,756 Gas distribution systemAbandonedJan 31, 00Dec 06, 01[C23C]
2001/0010,950 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer systemAbandonedJan 22, 01Aug 02, 01[H01L]
5925420 Method for preparing crosslinked aromatic polymers as low .kappa. dielectricsExpiredJul 16, 96Jul 20, 99[C08F]
5921560 Direct drive rotational motor with axial vacuumExpiredFeb 07, 97Jul 13, 99[B23B]
5916378 Method of reducing metal contamination during semiconductor processing in a reactor having metal componentsExpiredMar 11, 97Jun 29, 99[C23C]
5668063 Method of planarizing a layer of materialExpiredMay 23, 95Sep 16, 97[H01L]
5304398 Chemical vapor deposition of silicon dioxide using hexamethyldisilazaneExpiredJun 03, 93Apr 19, 94[C23C]
5232145 Method of soldering in a controlled-convection surface-mount reflow furnaceExpiredMar 29, 91Aug 03, 93[B23K, H05K]
5029471 Liquid level sensor assemblyExpiredOct 23, 90Jul 09, 91[G01F]
4891247 Process for borosilicate glass films for multilevel metallization structures in semiconductor devicesExpiredJun 29, 88Jan 02, 90[C23C]
4845054 Low temperature chemical vapor deposition of silicon dioxide filmsExpiredJun 29, 87Jul 04, 89[H01L]
4834020 Atmospheric pressure chemical vapor deposition apparatusExpiredDec 04, 87May 30, 89[C23C]
4834022 CVD reactor and gas injection systemExpiredOct 27, 87May 30, 89[C23C]
4787813 Industrial robot for use in clean room environmentExpiredAug 26, 87Nov 29, 88[B25J]
4673799 Fluidized bed heater for semiconductor processingExpiredMar 01, 85Jun 16, 87[C23C]

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