SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS, CHINESE ACADEMY OF SCIENCES

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 11194
 
  
 
G01M TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR562
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 599
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS396
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 375
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 394
 
  
 
A47B TABLES; DESKS; OFFICE FURNITURE; CABINETS; DRAWERS; GENERAL DETAILS OF FURNITURE 250
 
  
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 291
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 2204
 
  
 
C03C CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS159

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0184,455 MEASURING DEVICE FOR POINT DIFFRACTION INTERFEROMETRIC WAVEFRONT ABERRATION AND METHOD FOR DETECTING WAVE ABERRATIONDec 31, 15Jun 29, 17[G01J]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9863841 Measuring device having ideal wavefront generator for detecting point diffraction interferometric wavefront aberration of measured optical system and method for detecting wavefront aberration thereofDec 31, 15Jan 09, 18[G01J, G01M, G03F]
9804502 Illumination device and method for using the same in the projection lithography machineDec 30, 15Oct 31, 17[G02B, G03B, G03F]
9766154 Multi field point aberration parallel metrology device and method for lithographic projection lensDec 30, 15Sep 19, 17[G01M, G03F]
9709730 Hollow-core photonic crystal fiber gas cell and method for preparing the sameDec 28, 16Jul 18, 17[G01N, G02B]
9709896 Illumination system for lithographic projection exposure step-and-scan apparatusDec 30, 15Jul 18, 17[G03B, G03F]
9658114 Device for measuring point diffraction interferometric wavefront aberration and method for detecting wave aberrationDec 31, 15May 23, 17[G01J, G01M]
9559411 Method for producing infrared ZnS domesNov 23, 15Jan 31, 17[C04B, H01Q]
9488525 Method and apparatus for femtosecond laser pulse measurement based on transient-grating effectAug 22, 14Nov 08, 16[G01J, G02B]
9423621 Prism beam expansion systemNov 30, 15Aug 23, 16[G02B]
9400433 Lithography illumination systemJun 19, 15Jul 26, 16[G02B, G03B, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2005/0134,181 Pulsed high-power flash lamps made of compound quartz glass tubes and process for manufacture thereofAbandonedDec 16, 04Jun 23, 05[H01J]

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