SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2008/0274,605 METHOD OF MANUFACTURING SILICON NITRIDE FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICEAbandonedJul 02, 08Nov 06, 08[H01L]
2005/0181,304 Method of forming fine patternAbandonedFeb 15, 05Aug 18, 05[G03C]
2004/0248,042 Method of forming fine patternAbandonedApr 02, 04Dec 09, 04[G03C]
2004/0234,899 Method of forming fine patternAbandonedJan 08, 04Nov 25, 04[G03F]
2004/0101,787 Fine pattern forming methodAbandonedSep 08, 03May 27, 04[G03F]
2004/0028,269 Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor deviceAbandonedSep 24, 02Feb 12, 04[G06K]
2002/0182,037 Substrate processing apparatus, substrate processing system, and substrate conveying methodAbandonedMar 07, 02Dec 05, 02[B65G]

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