SEMEQUIP, INC.

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Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 17111
 
  
 
C01B NON-METALLIC ELEMENTS; COMPOUNDS THEREOF772
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 5357
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 244
 
  
 
A01C PLANTING; SOWING; FERTILISING 129
 
  
 
A01G HORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS, OR SEAWEED; FORESTRY; WATERING 131
 
  
 
A61N ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 1106
 
  
 
E03B INSTALLATIONS OR METHODS FOR OBTAINING, COLLECTING, OR DISTRIBUTING WATER 112
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 1110

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8753600 Methods of preparing clusterboronJan 18, 11Jun 17, 14[C01B]
8673251 Methods of preparing ClusterboronNov 03, 08Mar 18, 14[C01B]
8623309 Methods of preparing clusterboronNov 03, 08Jan 07, 14[C01B]
8618514 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsNov 02, 11Dec 31, 13[H01J]
8530343 System and method for the manufacture of semiconductor devices by the implantation of carbon clustersJun 27, 11Sep 10, 13[H01L]
8502161 External cathode ion sourceMay 10, 10Aug 06, 13[H01J]
8410459 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsMay 06, 11Apr 02, 13[H01J, G21K]
8329131 Isotopically-enriched boranes and methods of preparing themMay 17, 11Dec 11, 12[C01B]
8097529 System and method for the manufacture of semiconductor devices by the implantation of carbon clustersJul 24, 09Jan 17, 12[H01L]
8084007 Methods of synthesis of isotropically enriched borohydride and methods of synthesis of isotropically enriched boranesDec 31, 09Dec 27, 11[C01B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0061,816 ION IMPLANTATION DEVICE AND A METHOD OF SEMICONDUCTOR MANUFACTURING BY THE IMPLANTATION OF BORON HYDRIDE CLUSTER IONSAbandonedNov 06, 13Mar 06, 14[H01L]
8586459 Ion implantation with molecular ions containing phosphorus and arsenicExpiredNov 05, 07Nov 19, 13[H01L]
8436326 Ion beam apparatus and method employing magnetic scanningExpiredNov 17, 10May 07, 13[H01J, H01L]
8368309 Method and apparatus for extracting ions from an ion source for use in ion implantationExpiredDec 29, 06Feb 05, 13[H01J]
8330118 Multi mode ion sourceExpiredMay 13, 09Dec 11, 12[H01J]
8236675 Semiconductor device and method of fabricating a semiconductor deviceExpiredOct 02, 09Aug 07, 12[H01L]
8154210 Ion implantation ion source, system and methodExpiredDec 18, 09Apr 10, 12[H01J]
2012/0064,705 VAPORIZERAbandonedAug 26, 11Mar 15, 12[H01L, F22B]
8110815 Vapor delivery to devices under vacuumExpiredJun 11, 07Feb 07, 12[H01J]
8110820 Ion beam apparatus and method for ion implantationExpiredJun 13, 07Feb 07, 12[H01J]
8071958 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsExpiredNov 11, 08Dec 06, 11[H01J]
8013312 Vapor delivery system useful with ion sources and vaporizer for use in such systemExpiredNov 21, 07Sep 06, 11[C23C, G05D]
7994031 Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ionsExpiredDec 29, 06Aug 09, 11[H01L]
7955580 Isotopically-enriched boranes and methods of preparing themExpiredJan 21, 05Jun 07, 11[C01B]
7919402 Cluster ion implantation for defect engineeringExpiredApr 10, 08Apr 05, 11[H01L]
7875125 Method for extending equipment uptime in ion implantationExpiredSep 19, 08Jan 25, 11[B08B]
7641879 Methods of synthesis of isotopically enriched borohydride and methods of synthesis of isotopically enriched boranesExpiredJan 28, 05Jan 05, 10[C01B]
7629590 Method and apparatus for extending equipment uptime in ion implantationExpiredDec 29, 06Dec 08, 09[H01J]
7609003 Ion implantation system and control methodExpiredMar 01, 06Oct 27, 09[H01J]
2009/0250,603 MAGNETIC ANALYZER APPARATUS AND METHOD FOR ION IMPLANTATIONAbandonedJun 13, 07Oct 08, 09[H01J, A61N]

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